JPS551187A - Electron beam exposure apparatus - Google Patents

Electron beam exposure apparatus

Info

Publication number
JPS551187A
JPS551187A JP4909579A JP4909579A JPS551187A JP S551187 A JPS551187 A JP S551187A JP 4909579 A JP4909579 A JP 4909579A JP 4909579 A JP4909579 A JP 4909579A JP S551187 A JPS551187 A JP S551187A
Authority
JP
Japan
Prior art keywords
electron beam
exposure apparatus
lens
projection means
coils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4909579A
Other languages
Japanese (ja)
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4909579A priority Critical patent/JPS551187A/en
Publication of JPS551187A publication Critical patent/JPS551187A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To adjust the rotation of the beam with a simple construction using a non-rotary electronic lens arranged in a scanning electron beam exposure apparatus. CONSTITUTION:A non-rotary electronic lens composed of an electron beam projection means for projecting the electron beam to the optical axis comprising a DC power source and two coils 2 and 3 and an electron lens on which the electron beam projected from the projection means forms an image comprising a external yoke 6 for housing the coil 2 and 3 with the turn opposite to each other and lens pole pieces 7 to 10. Currents roughly identical to each other flow through the coils. This electronic lens is used as the final stage lenses 23 and 24 in a rectangular beam scanning exposure apparatus. The output of a detector is fed through a calculator to control deflecting plates 23 and 24 provided between the beam projection means and the lenses 23 and 24. In this manner, the rotation of the beam is adjusted with a simple construction.
JP4909579A 1979-04-23 1979-04-23 Electron beam exposure apparatus Pending JPS551187A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4909579A JPS551187A (en) 1979-04-23 1979-04-23 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4909579A JPS551187A (en) 1979-04-23 1979-04-23 Electron beam exposure apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3418176A Division JPS52117574A (en) 1976-03-30 1976-03-30 Electronic beam exposure unit

Publications (1)

Publication Number Publication Date
JPS551187A true JPS551187A (en) 1980-01-07

Family

ID=12821526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4909579A Pending JPS551187A (en) 1979-04-23 1979-04-23 Electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS551187A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400622A (en) * 1980-01-30 1983-08-23 Nippon Telegraph & Telephone Public Corporation Electron lens equipment
US4412132A (en) * 1981-07-08 1983-10-25 Jeol Ltd. Electron lens equipped with three magnetic pole pieces

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400622A (en) * 1980-01-30 1983-08-23 Nippon Telegraph & Telephone Public Corporation Electron lens equipment
US4412132A (en) * 1981-07-08 1983-10-25 Jeol Ltd. Electron lens equipped with three magnetic pole pieces

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