JPS55102227A - Ion implantation - Google Patents

Ion implantation

Info

Publication number
JPS55102227A
JPS55102227A JP823979A JP823979A JPS55102227A JP S55102227 A JPS55102227 A JP S55102227A JP 823979 A JP823979 A JP 823979A JP 823979 A JP823979 A JP 823979A JP S55102227 A JPS55102227 A JP S55102227A
Authority
JP
Japan
Prior art keywords
peak
ions
implanted
thickness
acceleration voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP823979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS626648B2 (enrdf_load_stackoverflow
Inventor
Yasuo Wada
Hiroo Usui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP823979A priority Critical patent/JPS55102227A/ja
Publication of JPS55102227A publication Critical patent/JPS55102227A/ja
Publication of JPS626648B2 publication Critical patent/JPS626648B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP823979A 1979-01-29 1979-01-29 Ion implantation Granted JPS55102227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP823979A JPS55102227A (en) 1979-01-29 1979-01-29 Ion implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP823979A JPS55102227A (en) 1979-01-29 1979-01-29 Ion implantation

Publications (2)

Publication Number Publication Date
JPS55102227A true JPS55102227A (en) 1980-08-05
JPS626648B2 JPS626648B2 (enrdf_load_stackoverflow) 1987-02-12

Family

ID=11687587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP823979A Granted JPS55102227A (en) 1979-01-29 1979-01-29 Ion implantation

Country Status (1)

Country Link
JP (1) JPS55102227A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887816A (ja) * 1981-11-20 1983-05-25 Hitachi Ltd 不純物のド−ビング方法
JPS62229934A (ja) * 1986-03-31 1987-10-08 Toshiba Corp 半導体装置の製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6454169A (en) * 1987-08-22 1989-03-01 Akira Hoshi Controller for bath hot water
JPH0293242A (ja) * 1988-09-30 1990-04-04 Matsushita Electric Ind Co Ltd 給湯機付風呂釜

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5887816A (ja) * 1981-11-20 1983-05-25 Hitachi Ltd 不純物のド−ビング方法
JPS62229934A (ja) * 1986-03-31 1987-10-08 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS626648B2 (enrdf_load_stackoverflow) 1987-02-12

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