JPS549575A - Ion injection method - Google Patents

Ion injection method

Info

Publication number
JPS549575A
JPS549575A JP7533077A JP7533077A JPS549575A JP S549575 A JPS549575 A JP S549575A JP 7533077 A JP7533077 A JP 7533077A JP 7533077 A JP7533077 A JP 7533077A JP S549575 A JPS549575 A JP S549575A
Authority
JP
Japan
Prior art keywords
ion injection
injection method
conductive material
material film
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7533077A
Other languages
Japanese (ja)
Inventor
Tsuguo Inada
Teruo Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7533077A priority Critical patent/JPS549575A/en
Publication of JPS549575A publication Critical patent/JPS549575A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To decrease the charge storage on the surface, to eliminate the discharge from the wafer and thus to avoid the deterioration, by forming the conductive material film avoiding the chip pattern of the insulator wafer to which the ion is to be injected and then carrying out the ion injection while giving earth to the conductive material film.
COPYRIGHT: (C)1979,JPO&Japio
JP7533077A 1977-06-24 1977-06-24 Ion injection method Pending JPS549575A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7533077A JPS549575A (en) 1977-06-24 1977-06-24 Ion injection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7533077A JPS549575A (en) 1977-06-24 1977-06-24 Ion injection method

Publications (1)

Publication Number Publication Date
JPS549575A true JPS549575A (en) 1979-01-24

Family

ID=13573130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7533077A Pending JPS549575A (en) 1977-06-24 1977-06-24 Ion injection method

Country Status (1)

Country Link
JP (1) JPS549575A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775463A (en) * 1980-10-28 1982-05-12 Nec Corp Manufacture of semiconductor device
JPS5775424A (en) * 1980-10-29 1982-05-12 Nec Corp Ion implantation
JPS57100768A (en) * 1980-12-16 1982-06-23 Nec Corp Manufacture of field effect semiconductor device
JPS62248223A (en) * 1986-04-21 1987-10-29 Sumitomo Eaton Noba Kk Charging-preventive method for wafer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775463A (en) * 1980-10-28 1982-05-12 Nec Corp Manufacture of semiconductor device
JPH033388B2 (en) * 1980-10-28 1991-01-18 Nippon Electric Co
JPS5775424A (en) * 1980-10-29 1982-05-12 Nec Corp Ion implantation
JPS57100768A (en) * 1980-12-16 1982-06-23 Nec Corp Manufacture of field effect semiconductor device
JPS62248223A (en) * 1986-04-21 1987-10-29 Sumitomo Eaton Noba Kk Charging-preventive method for wafer

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