JPS5481133A - Anodic oxidation device - Google Patents

Anodic oxidation device

Info

Publication number
JPS5481133A
JPS5481133A JP14904477A JP14904477A JPS5481133A JP S5481133 A JPS5481133 A JP S5481133A JP 14904477 A JP14904477 A JP 14904477A JP 14904477 A JP14904477 A JP 14904477A JP S5481133 A JPS5481133 A JP S5481133A
Authority
JP
Japan
Prior art keywords
cathode
negative plates
aluminum strip
bonded
current density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14904477A
Other languages
English (en)
Japanese (ja)
Inventor
Teruo Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP14904477A priority Critical patent/JPS5481133A/ja
Priority to GB7847641A priority patent/GB2012305B/en
Priority to DE19782853609 priority patent/DE2853609A1/de
Publication of JPS5481133A publication Critical patent/JPS5481133A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/0029—Processes of manufacture
    • H01G9/0032—Processes of manufacture formation of the dielectric layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005—Apparatus specially adapted for electrolytic conversion coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electrochemical Coating By Surface Reaction (AREA)
JP14904477A 1977-12-12 1977-12-12 Anodic oxidation device Pending JPS5481133A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP14904477A JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device
GB7847641A GB2012305B (en) 1977-12-12 1978-12-07 Apparatus for anodic oxidation
DE19782853609 DE2853609A1 (de) 1977-12-12 1978-12-12 Verfahren und vorrichtung fuer anodische oxidation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14904477A JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device

Publications (1)

Publication Number Publication Date
JPS5481133A true JPS5481133A (en) 1979-06-28

Family

ID=15466414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14904477A Pending JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device

Country Status (3)

Country Link
JP (1) JPS5481133A (enrdf_load_stackoverflow)
DE (1) DE2853609A1 (enrdf_load_stackoverflow)
GB (1) GB2012305B (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
EP2100677A1 (en) 2008-03-06 2009-09-16 Fujifilm Corporation Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support
WO2010150810A1 (ja) 2009-06-26 2010-12-29 富士フイルム株式会社 光反射基板およびその製造方法
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
WO2011078010A1 (ja) 2009-12-25 2011-06-30 富士フイルム株式会社 絶縁基板、絶縁基板の製造方法、配線の形成方法、配線基板および発光素子
EP2384100A2 (en) 2010-04-28 2011-11-02 Fujifilm Corporation Insulated light-reflective substrate
EP2420869A2 (en) 2010-08-16 2012-02-22 Fujifilm Corporation Radiation reflection plate for LED
WO2013005717A1 (ja) 2011-07-04 2013-01-10 富士フイルム株式会社 絶縁反射基板およびその製造方法
EP2586621A1 (en) 2011-10-28 2013-05-01 Fujifilm Corporation Manufacturing method and manufacturing apparatus of support for planographic printing plate
CN104419960A (zh) * 2013-08-20 2015-03-18 谢彪 阳极氧化生产线及其生产工艺

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751289A (en) * 1980-09-10 1982-03-26 Fuji Photo Film Co Ltd Electrolytic treating device for belt-like metallic plate
JPS60501564A (ja) * 1983-06-13 1985-09-19 ヘキスト　アクチエンゲゼルシヤフト アルミニウムバンドの一面を連続的に陽極酸化する方法及び装置
CH655135A5 (de) * 1983-07-14 1986-03-27 Alusuisse Vorbehandlung eines bandes oder einer folie aus aluminium durch elektrochemische oxidation.
US6368483B1 (en) 1997-04-25 2002-04-09 Alcan International Limited Aluminium workpiece
WO2008013820A2 (en) 2006-07-26 2008-01-31 The Board Of Trustees Of University Of Illinois Buried circumferential electrode microcavity plasma device arrays, electrical interconnects, and formation method
WO2008153663A1 (en) 2007-05-16 2008-12-18 The Board Of Trustees Of The University Of Illinois Arrays of microcavity plasma devices and electrodes with reduced mechanical stress
US8362699B2 (en) 2007-10-25 2013-01-29 The Board Of Trustees Of The University Of Illinois Interwoven wire mesh microcavity plasma arrays
JP5278789B2 (ja) 2007-12-28 2013-09-04 スズキ株式会社 陽極酸化処理装置
ZA200906786B (en) * 2008-10-16 2010-05-26 Internat Advanced Res Ct Arci A process for continuous coating deposition and an apparatus for carrying out the process
US8547004B2 (en) 2010-07-27 2013-10-01 The Board Of Trustees Of The University Of Illinois Encapsulated metal microtip microplasma devices, arrays and fabrication methods

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD51177A (enrdf_load_stackoverflow) *
DE683169C (de) * 1937-10-04 1939-10-31 Hermann Papst Verfahren zur elektrischen Oxydation von Aluminiumdraehten und -baendern
GB1055001A (enrdf_load_stackoverflow) * 1964-02-04
DD113024A1 (enrdf_load_stackoverflow) * 1974-08-14 1975-05-12

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
EP2100677A1 (en) 2008-03-06 2009-09-16 Fujifilm Corporation Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support
WO2010150810A1 (ja) 2009-06-26 2010-12-29 富士フイルム株式会社 光反射基板およびその製造方法
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
WO2011078010A1 (ja) 2009-12-25 2011-06-30 富士フイルム株式会社 絶縁基板、絶縁基板の製造方法、配線の形成方法、配線基板および発光素子
EP2384100A2 (en) 2010-04-28 2011-11-02 Fujifilm Corporation Insulated light-reflective substrate
EP2420869A2 (en) 2010-08-16 2012-02-22 Fujifilm Corporation Radiation reflection plate for LED
WO2013005717A1 (ja) 2011-07-04 2013-01-10 富士フイルム株式会社 絶縁反射基板およびその製造方法
EP2586621A1 (en) 2011-10-28 2013-05-01 Fujifilm Corporation Manufacturing method and manufacturing apparatus of support for planographic printing plate
CN104419960A (zh) * 2013-08-20 2015-03-18 谢彪 阳极氧化生产线及其生产工艺

Also Published As

Publication number Publication date
GB2012305B (en) 1982-06-09
GB2012305A (en) 1979-07-25
DE2853609C2 (enrdf_load_stackoverflow) 1991-09-26
DE2853609A1 (de) 1979-06-13

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