JPS57210996A - High speed anodization method - Google Patents
High speed anodization methodInfo
- Publication number
- JPS57210996A JPS57210996A JP9573481A JP9573481A JPS57210996A JP S57210996 A JPS57210996 A JP S57210996A JP 9573481 A JP9573481 A JP 9573481A JP 9573481 A JP9573481 A JP 9573481A JP S57210996 A JPS57210996 A JP S57210996A
- Authority
- JP
- Japan
- Prior art keywords
- work
- electrolytic bath
- bath
- cell
- high speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To perform high speed anodization in such a way that a practicable film is obtained in a short time by flowing an electrolytic bath immersed with a material to be treated, and conducting electricity within a specific current density range with the work as the anode and an electrolytic bath cell as the cathode.
CONSTITUTION: In a liquid sealing box 12 made of, for example, PVC, constituting an anodizing device 11, the work 20 is supported at both ends respectively by means of work holders 14, 15 in a loosely fitted state in a cylindrical electrolytic bath cell 13. An electrolyte of 1W60wt% electrolyte concns. and 5W40°C bath temps. is filled by a pump 16 into the cell 13, and is circulated in a direction A at 3W7m/sec speeds. The work 20 is immersed in the electrolytic bath in this way, and with the work 20 as the anode via the holder 15 and the bath 13 as the cathode, the work is anodized by a DC electric power source 19 with a 3W100A/dm2 current density.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9573481A JPS57210996A (en) | 1981-06-20 | 1981-06-20 | High speed anodization method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9573481A JPS57210996A (en) | 1981-06-20 | 1981-06-20 | High speed anodization method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57210996A true JPS57210996A (en) | 1982-12-24 |
Family
ID=14145701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9573481A Pending JPS57210996A (en) | 1981-06-20 | 1981-06-20 | High speed anodization method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57210996A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599194A (en) * | 1982-06-28 | 1984-01-18 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Imparting of barrier wall to surface of aluminum substrate |
JPS6029493A (en) * | 1983-07-20 | 1985-02-14 | Pentel Kk | Manufacture of aluminum or aluminum alloy substrate having oxide film |
CN102312262A (en) * | 2011-08-22 | 2012-01-11 | 吴江市精工铝字制造厂 | Hard anodization method of mixed acid of copper aluminium alloy |
RU2773771C1 (en) * | 2021-11-17 | 2022-06-09 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технологический университет "СТАНКИН" (ФГБОУ ВО "МГТУ "СТАНКИН") | Device for plasma-electrolyte processing of products from valve metals and their alloys |
-
1981
- 1981-06-20 JP JP9573481A patent/JPS57210996A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599194A (en) * | 1982-06-28 | 1984-01-18 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Imparting of barrier wall to surface of aluminum substrate |
JPS6230276B2 (en) * | 1982-06-28 | 1987-07-01 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS6029493A (en) * | 1983-07-20 | 1985-02-14 | Pentel Kk | Manufacture of aluminum or aluminum alloy substrate having oxide film |
CN102312262A (en) * | 2011-08-22 | 2012-01-11 | 吴江市精工铝字制造厂 | Hard anodization method of mixed acid of copper aluminium alloy |
RU2773771C1 (en) * | 2021-11-17 | 2022-06-09 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технологический университет "СТАНКИН" (ФГБОУ ВО "МГТУ "СТАНКИН") | Device for plasma-electrolyte processing of products from valve metals and their alloys |
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