JPS5481133A - Anodic oxidation device - Google Patents

Anodic oxidation device

Info

Publication number
JPS5481133A
JPS5481133A JP14904477A JP14904477A JPS5481133A JP S5481133 A JPS5481133 A JP S5481133A JP 14904477 A JP14904477 A JP 14904477A JP 14904477 A JP14904477 A JP 14904477A JP S5481133 A JPS5481133 A JP S5481133A
Authority
JP
Japan
Prior art keywords
cathode
negative plates
aluminum strip
bonded
current density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14904477A
Other languages
Japanese (ja)
Inventor
Teruo Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP14904477A priority Critical patent/JPS5481133A/en
Priority to GB7847641A priority patent/GB2012305B/en
Priority to DE19782853609 priority patent/DE2853609A1/en
Publication of JPS5481133A publication Critical patent/JPS5481133A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/0029—Processes of manufacture
    • H01G9/0032—Processes of manufacture formation of the dielectric layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005—Apparatus specially adapted for electrolytic conversion coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon

Abstract

PURPOSE: To provide the subject device wherein between both ends of cathode plates of an anodic oxidation device for forming an oxidation film on an aluminum strip during the continuous conveying operation, the negative plates are bonded to the cathode of a power source, whereby the subject device is capable of carrying out electrolysis without causing any difficulty at a high current density.
CONSTITUTION: In an electrolytic cell 6 filled with an electrolyte there are provided a plurality of negative plates 9 and 9 confronting an aluminum strip 1. These negative plates 9 and 9 are bonded to the cathode of the source 10 at the central part of said negative plates 9 and 9. In this electrolytic cell 6 the aluminum strip 1 acts as an anode. As a result of the electrolysis, an oxidation film is formed on the surface of the aluminum strip 1. As described above, when the negative plates 9 and 9 are bonded to the cathode 10 of the power source, and "electrolytic etching" phenomenon by which an oxidation film is formed concentrically at the end part of the aluminum strip near to the bonded end of the negative plates and the cathode of the power source can be prevented even when the current density becomes as high as 5-10 A/dm2, whereby it is possible to carry out electrolysis at a high current density without causing any trouble.
COPYRIGHT: (C)1979,JPO&Japio
JP14904477A 1977-12-12 1977-12-12 Anodic oxidation device Pending JPS5481133A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP14904477A JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device
GB7847641A GB2012305B (en) 1977-12-12 1978-12-07 Apparatus for anodic oxidation
DE19782853609 DE2853609A1 (en) 1977-12-12 1978-12-12 METHOD AND DEVICE FOR ANODIC OXIDATION

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14904477A JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device

Publications (1)

Publication Number Publication Date
JPS5481133A true JPS5481133A (en) 1979-06-28

Family

ID=15466414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14904477A Pending JPS5481133A (en) 1977-12-12 1977-12-12 Anodic oxidation device

Country Status (3)

Country Link
JP (1) JPS5481133A (en)
DE (1) DE2853609A1 (en)
GB (1) GB2012305B (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
EP2100677A1 (en) 2008-03-06 2009-09-16 Fujifilm Corporation Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support
WO2010150810A1 (en) 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
WO2011037005A1 (en) 2009-09-24 2011-03-31 富士フイルム株式会社 Lithographic printing original plate
WO2011078010A1 (en) 2009-12-25 2011-06-30 富士フイルム株式会社 Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element
EP2384100A2 (en) 2010-04-28 2011-11-02 Fujifilm Corporation Insulated light-reflective substrate
EP2420869A2 (en) 2010-08-16 2012-02-22 Fujifilm Corporation Radiation reflection plate for LED
WO2013005717A1 (en) 2011-07-04 2013-01-10 富士フイルム株式会社 Insulating reflective substrate and method for producing same
EP2586621A1 (en) 2011-10-28 2013-05-01 Fujifilm Corporation Manufacturing method and manufacturing apparatus of support for planographic printing plate
CN104419960A (en) * 2013-08-20 2015-03-18 谢彪 Anodic oxidation production line and production process thereof

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751289A (en) * 1980-09-10 1982-03-26 Fuji Photo Film Co Ltd Electrolytic treating device for belt-like metallic plate
US4605480A (en) * 1983-06-13 1986-08-12 Hoechst Aktiengesellschaft Device for continuously anodically oxidizing aluminum strips on one surface thereof and use of these aluminum strips in the production of offset printing plates
CH655135A5 (en) * 1983-07-14 1986-03-27 Alusuisse PRE-TREATMENT OF AN ALUMINUM TAPE OR FILM BY ELECTROCHEMICAL OXIDATION.
WO1998049377A1 (en) * 1997-04-25 1998-11-05 Alcan International Limited Aluminium workpiece
JP5399901B2 (en) 2006-07-26 2014-01-29 ザ ボード オブ トラスティーズ オブ ザ ユニバーシティ オブ イリノイ Embedded ambient electrode microcavity plasma device array, electrical interconnection and formation method
EP2153454B1 (en) * 2007-05-16 2013-04-24 The Board Of Trustees Of The University Of Illinois Arrays of microcavity plasma devices and electrodes with reduced mechanical stress
US8362699B2 (en) 2007-10-25 2013-01-29 The Board Of Trustees Of The University Of Illinois Interwoven wire mesh microcavity plasma arrays
JP5278789B2 (en) * 2007-12-28 2013-09-04 スズキ株式会社 Anodizing equipment
ZA200906786B (en) * 2008-10-16 2010-05-26 Internat Advanced Res Ct Arci A process for continuous coating deposition and an apparatus for carrying out the process
US8547004B2 (en) 2010-07-27 2013-10-01 The Board Of Trustees Of The University Of Illinois Encapsulated metal microtip microplasma devices, arrays and fabrication methods

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD51177A (en) *
DE683169C (en) * 1937-10-04 1939-10-31 Hermann Papst Process for the electrical oxidation of aluminum wires and strips
GB1055001A (en) * 1964-02-04
DD113024A1 (en) * 1974-08-14 1975-05-12

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
EP2100677A1 (en) 2008-03-06 2009-09-16 Fujifilm Corporation Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support
WO2010150810A1 (en) 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
WO2011037005A1 (en) 2009-09-24 2011-03-31 富士フイルム株式会社 Lithographic printing original plate
WO2011078010A1 (en) 2009-12-25 2011-06-30 富士フイルム株式会社 Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element
EP2384100A2 (en) 2010-04-28 2011-11-02 Fujifilm Corporation Insulated light-reflective substrate
EP2420869A2 (en) 2010-08-16 2012-02-22 Fujifilm Corporation Radiation reflection plate for LED
WO2013005717A1 (en) 2011-07-04 2013-01-10 富士フイルム株式会社 Insulating reflective substrate and method for producing same
EP2586621A1 (en) 2011-10-28 2013-05-01 Fujifilm Corporation Manufacturing method and manufacturing apparatus of support for planographic printing plate
CN104419960A (en) * 2013-08-20 2015-03-18 谢彪 Anodic oxidation production line and production process thereof

Also Published As

Publication number Publication date
DE2853609C2 (en) 1991-09-26
GB2012305B (en) 1982-06-09
GB2012305A (en) 1979-07-25
DE2853609A1 (en) 1979-06-13

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