JPS5475439A - Electrolytic etching method - Google Patents

Electrolytic etching method

Info

Publication number
JPS5475439A
JPS5475439A JP14202177A JP14202177A JPS5475439A JP S5475439 A JPS5475439 A JP S5475439A JP 14202177 A JP14202177 A JP 14202177A JP 14202177 A JP14202177 A JP 14202177A JP S5475439 A JPS5475439 A JP S5475439A
Authority
JP
Japan
Prior art keywords
electrolytic etching
current
recess
cell
carry out
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14202177A
Other languages
Japanese (ja)
Other versions
JPS5919200B2 (en
Inventor
Kenichi Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP14202177A priority Critical patent/JPS5919200B2/en
Publication of JPS5475439A publication Critical patent/JPS5475439A/en
Publication of JPS5919200B2 publication Critical patent/JPS5919200B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

PURPOSE: To carry out efficient one-side electrolytic etching of an object of Al material by placing an insulating frame on which the object is mounted between cathode and anode plates in a cell and indirectly supplying a current to the object.
CONSTITUTION: Cathode plate 20, insulating frame 30 and anode plate 40 are arranged lengthwise in cell 10, and a current is supplied in electrolyte B. Frame 30 is provided with recess 31 and one or more openings 32, and object A to be etched is fixed to recess 31. By this indirect current supply system only one side of object A can be etched uniformly. Many insulating frames may be passed along a guide rail to carry out continuous electrolytic etching.
COPYRIGHT: (C)1979,JPO&Japio
JP14202177A 1977-11-26 1977-11-26 Electrolytic etching method Expired JPS5919200B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14202177A JPS5919200B2 (en) 1977-11-26 1977-11-26 Electrolytic etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14202177A JPS5919200B2 (en) 1977-11-26 1977-11-26 Electrolytic etching method

Publications (2)

Publication Number Publication Date
JPS5475439A true JPS5475439A (en) 1979-06-16
JPS5919200B2 JPS5919200B2 (en) 1984-05-02

Family

ID=15305512

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14202177A Expired JPS5919200B2 (en) 1977-11-26 1977-11-26 Electrolytic etching method

Country Status (1)

Country Link
JP (1) JPS5919200B2 (en)

Also Published As

Publication number Publication date
JPS5919200B2 (en) 1984-05-02

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