JPS5480080A - Etching device - Google Patents

Etching device

Info

Publication number
JPS5480080A
JPS5480080A JP14707177A JP14707177A JPS5480080A JP S5480080 A JPS5480080 A JP S5480080A JP 14707177 A JP14707177 A JP 14707177A JP 14707177 A JP14707177 A JP 14707177A JP S5480080 A JPS5480080 A JP S5480080A
Authority
JP
Japan
Prior art keywords
electrode
uniform
etching
opposing
center part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14707177A
Other languages
English (en)
Other versions
JPS6032972B2 (ja
Inventor
Tatsumi Mizutani
Hideo Komatsu
Shinya Iida
Yukiyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52147071A priority Critical patent/JPS6032972B2/ja
Publication of JPS5480080A publication Critical patent/JPS5480080A/ja
Publication of JPS6032972B2 publication Critical patent/JPS6032972B2/ja
Expired legal-status Critical Current

Links

JP52147071A 1977-12-09 1977-12-09 エツチング装置 Expired JPS6032972B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52147071A JPS6032972B2 (ja) 1977-12-09 1977-12-09 エツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52147071A JPS6032972B2 (ja) 1977-12-09 1977-12-09 エツチング装置

Publications (2)

Publication Number Publication Date
JPS5480080A true JPS5480080A (en) 1979-06-26
JPS6032972B2 JPS6032972B2 (ja) 1985-07-31

Family

ID=15421807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52147071A Expired JPS6032972B2 (ja) 1977-12-09 1977-12-09 エツチング装置

Country Status (1)

Country Link
JP (1) JPS6032972B2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5842234A (ja) * 1981-09-04 1983-03-11 Kokusai Electric Co Ltd プラズマ・ドライエツチング装置
JPS58151666U (ja) * 1982-04-05 1983-10-11 沖電気工業株式会社 プラズマ・エツチング装置
JPH0620976A (ja) * 1983-08-08 1994-01-28 Semiconductor Energy Lab Co Ltd プラズマ気相反応装置およびプラズマ気相反応方法
JPH06140347A (ja) * 1993-05-13 1994-05-20 Semiconductor Energy Lab Co Ltd プラズマ気相反応方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127168A (en) * 1976-04-19 1977-10-25 Fujitsu Ltd Etching unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127168A (en) * 1976-04-19 1977-10-25 Fujitsu Ltd Etching unit

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5842234A (ja) * 1981-09-04 1983-03-11 Kokusai Electric Co Ltd プラズマ・ドライエツチング装置
JPS58151666U (ja) * 1982-04-05 1983-10-11 沖電気工業株式会社 プラズマ・エツチング装置
JPS6126366Y2 (ja) * 1982-04-05 1986-08-07
JPH0620976A (ja) * 1983-08-08 1994-01-28 Semiconductor Energy Lab Co Ltd プラズマ気相反応装置およびプラズマ気相反応方法
JP2564748B2 (ja) * 1983-08-08 1996-12-18 株式会社 半導体エネルギー研究所 プラズマ気相反応装置およびプラズマ気相反応方法
JPH06140347A (ja) * 1993-05-13 1994-05-20 Semiconductor Energy Lab Co Ltd プラズマ気相反応方法
JP2564753B2 (ja) * 1993-05-13 1996-12-18 株式会社 半導体エネルギー研究所 プラズマ気相反応方法

Also Published As

Publication number Publication date
JPS6032972B2 (ja) 1985-07-31

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