JPS547873A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS547873A
JPS547873A JP7289277A JP7289277A JPS547873A JP S547873 A JPS547873 A JP S547873A JP 7289277 A JP7289277 A JP 7289277A JP 7289277 A JP7289277 A JP 7289277A JP S547873 A JPS547873 A JP S547873A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
restricting
solvents
mutual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7289277A
Other languages
Japanese (ja)
Other versions
JPS6032350B2 (en
Inventor
Masao Kanazawa
Hitoshi Hoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7289277A priority Critical patent/JPS6032350B2/en
Publication of JPS547873A publication Critical patent/JPS547873A/en
Publication of JPS6032350B2 publication Critical patent/JPS6032350B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To make easy multi layer coating and lifting off, by changing the forming temperature of resist layer for the upper and lower two layers and by restricting the mutual solving for the solvents.
COPYRIGHT: (C)1979,JPO&Japio
JP7289277A 1977-06-21 1977-06-21 Manufacturing method of semiconductor device Expired JPS6032350B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7289277A JPS6032350B2 (en) 1977-06-21 1977-06-21 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7289277A JPS6032350B2 (en) 1977-06-21 1977-06-21 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS547873A true JPS547873A (en) 1979-01-20
JPS6032350B2 JPS6032350B2 (en) 1985-07-27

Family

ID=13502445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7289277A Expired JPS6032350B2 (en) 1977-06-21 1977-06-21 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS6032350B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60100432A (en) * 1983-11-05 1985-06-04 Oki Electric Ind Co Ltd Formation for lift-off metal pattern
WO2019146241A1 (en) * 2018-01-26 2019-08-01 株式会社Ｓｃｒｅｅｎホールディングス Application method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60100432A (en) * 1983-11-05 1985-06-04 Oki Electric Ind Co Ltd Formation for lift-off metal pattern
JPH0149015B2 (en) * 1983-11-05 1989-10-23 Oki Electric Ind Co Ltd
WO2019146241A1 (en) * 2018-01-26 2019-08-01 株式会社Ｓｃｒｅｅｎホールディングス Application method
JP2019126795A (en) * 2018-01-26 2019-08-01 株式会社Ｓｃｒｅｅｎホールディングス Coating method
TWI693109B (en) * 2018-01-26 2020-05-11 日商斯庫林集團股份有限公司 Coating method

Also Published As

Publication number Publication date
JPS6032350B2 (en) 1985-07-27

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