JPS546466A - Surface cleaning method - Google Patents

Surface cleaning method

Info

Publication number
JPS546466A
JPS546466A JP7110077A JP7110077A JPS546466A JP S546466 A JPS546466 A JP S546466A JP 7110077 A JP7110077 A JP 7110077A JP 7110077 A JP7110077 A JP 7110077A JP S546466 A JPS546466 A JP S546466A
Authority
JP
Japan
Prior art keywords
cleaning method
surface cleaning
oxidization
contaminants
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7110077A
Other languages
Japanese (ja)
Inventor
Akihiro Tomosawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7110077A priority Critical patent/JPS546466A/en
Publication of JPS546466A publication Critical patent/JPS546466A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To manufacture a clean surface by removing a surface layer as well as oxidization contaminants through etching after low-temperature oxidization.
COPYRIGHT: (C)1979,JPO&Japio
JP7110077A 1977-06-17 1977-06-17 Surface cleaning method Pending JPS546466A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7110077A JPS546466A (en) 1977-06-17 1977-06-17 Surface cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7110077A JPS546466A (en) 1977-06-17 1977-06-17 Surface cleaning method

Publications (1)

Publication Number Publication Date
JPS546466A true JPS546466A (en) 1979-01-18

Family

ID=13450775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7110077A Pending JPS546466A (en) 1977-06-17 1977-06-17 Surface cleaning method

Country Status (1)

Country Link
JP (1) JPS546466A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629634A (en) * 1985-07-05 1987-01-17 Mitsubishi Metal Corp Conveying method for silicon wafer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50124574A (en) * 1974-03-18 1975-09-30
JPS50150373A (en) * 1974-05-22 1975-12-02
JPS51121254A (en) * 1975-03-28 1976-10-23 Rca Corp Method of removing impurities from silicon wafer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50124574A (en) * 1974-03-18 1975-09-30
JPS50150373A (en) * 1974-05-22 1975-12-02
JPS51121254A (en) * 1975-03-28 1976-10-23 Rca Corp Method of removing impurities from silicon wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629634A (en) * 1985-07-05 1987-01-17 Mitsubishi Metal Corp Conveying method for silicon wafer

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