JPS546466A - Surface cleaning method - Google Patents
Surface cleaning methodInfo
- Publication number
- JPS546466A JPS546466A JP7110077A JP7110077A JPS546466A JP S546466 A JPS546466 A JP S546466A JP 7110077 A JP7110077 A JP 7110077A JP 7110077 A JP7110077 A JP 7110077A JP S546466 A JPS546466 A JP S546466A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning method
- surface cleaning
- oxidization
- contaminants
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To manufacture a clean surface by removing a surface layer as well as oxidization contaminants through etching after low-temperature oxidization.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7110077A JPS546466A (en) | 1977-06-17 | 1977-06-17 | Surface cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7110077A JPS546466A (en) | 1977-06-17 | 1977-06-17 | Surface cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS546466A true JPS546466A (en) | 1979-01-18 |
Family
ID=13450775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7110077A Pending JPS546466A (en) | 1977-06-17 | 1977-06-17 | Surface cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS546466A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS629634A (en) * | 1985-07-05 | 1987-01-17 | Mitsubishi Metal Corp | Conveying method for silicon wafer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50124574A (en) * | 1974-03-18 | 1975-09-30 | ||
JPS50150373A (en) * | 1974-05-22 | 1975-12-02 | ||
JPS51121254A (en) * | 1975-03-28 | 1976-10-23 | Rca Corp | Method of removing impurities from silicon wafer |
-
1977
- 1977-06-17 JP JP7110077A patent/JPS546466A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50124574A (en) * | 1974-03-18 | 1975-09-30 | ||
JPS50150373A (en) * | 1974-05-22 | 1975-12-02 | ||
JPS51121254A (en) * | 1975-03-28 | 1976-10-23 | Rca Corp | Method of removing impurities from silicon wafer |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS629634A (en) * | 1985-07-05 | 1987-01-17 | Mitsubishi Metal Corp | Conveying method for silicon wafer |
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