JPS5463682A - Production of mask for x-ray exposure - Google Patents

Production of mask for x-ray exposure

Info

Publication number
JPS5463682A
JPS5463682A JP9946978A JP9946978A JPS5463682A JP S5463682 A JPS5463682 A JP S5463682A JP 9946978 A JP9946978 A JP 9946978A JP 9946978 A JP9946978 A JP 9946978A JP S5463682 A JPS5463682 A JP S5463682A
Authority
JP
Japan
Prior art keywords
spacer
layer
mask
plating
adhere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9946978A
Other languages
Japanese (ja)
Inventor
Hitoshi Honma
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9946978A priority Critical patent/JPS5463682A/en
Publication of JPS5463682A publication Critical patent/JPS5463682A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To make it easy to control the thickness of a spacer and obtain a good adhesion by causing a metallic layer to adhere to all the surface of a mask substrate and forming an optical absorption pattern and a spacer part by pattering and subjecting only the spacer part to plating.
CONSTITUTION: Au plating film 12 which becomes a ground metallic layer is caused to adhere onto mask substrate 11 such as Si and is subjected to patterning with a resistor mask to make only spacer part 13 remain and remove the needless part which becomes an optical absorption pattern. Next, the surface of remaining spacer part 13 is etched by an acid, and Au layer 14 is caused to adhere there for the purpose of obtaining a good adhesion to spacer materials such as Au and Ni which are plated after. After that, Au plating layer 15a or Ni plating layer 15b is formed on this layer 14, thereby making a spacer. As a result, the mask is enhanced in strength and becomes long-life because of reduced waste.
COPYRIGHT: (C)1979,JPO&Japio
JP9946978A 1978-08-17 1978-08-17 Production of mask for x-ray exposure Pending JPS5463682A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9946978A JPS5463682A (en) 1978-08-17 1978-08-17 Production of mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9946978A JPS5463682A (en) 1978-08-17 1978-08-17 Production of mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS5463682A true JPS5463682A (en) 1979-05-22

Family

ID=14248162

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9946978A Pending JPS5463682A (en) 1978-08-17 1978-08-17 Production of mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5463682A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06294898A (en) * 1993-04-07 1994-10-21 Rigaku Denki Kogyo Kk Optical element and light condensing element for x-ray

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4882778A (en) * 1972-01-14 1973-11-05

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4882778A (en) * 1972-01-14 1973-11-05

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06294898A (en) * 1993-04-07 1994-10-21 Rigaku Denki Kogyo Kk Optical element and light condensing element for x-ray

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