JPS5456361A - Semiconductor element - Google Patents
Semiconductor elementInfo
- Publication number
- JPS5456361A JPS5456361A JP12238877A JP12238877A JPS5456361A JP S5456361 A JPS5456361 A JP S5456361A JP 12238877 A JP12238877 A JP 12238877A JP 12238877 A JP12238877 A JP 12238877A JP S5456361 A JPS5456361 A JP S5456361A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- constitution
- current density
- high current
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE: To make a zener diode having an extremely shallow diffused layer by using metals which do not form eutectic alloy with Si at below glass sealing temperature or bonding temperature operated at a high current density.
CONSTITUTION: An opening is made in the oxide film 2 and PSG film 3 on an n type Si substrate 1 and an extremely shallow p layer 4 is made. Next, W 5, Cr 6, silver 7 are laminated, and a p layer 4 is selectively covered and is then removed, after which a silver bump 8 is thickly provided on the layer 7 surface. With this constitution, W-Si eutectic temperature is 1400°C and therefore W-Si eutectic alloy is not formed even when bonding temperature rises under operation at a high current density or even at the time of sealing glass tube at 650°C. Hence, the degradation or decrease in dielectric strength is prevented because this does not break down the shallow p layer 4. Since W and Mo has good thermal alignment with Si and may be readily selectively etched with an alkaline base etching solution, production is easy
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12238877A JPS5456361A (en) | 1977-10-14 | 1977-10-14 | Semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12238877A JPS5456361A (en) | 1977-10-14 | 1977-10-14 | Semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5456361A true JPS5456361A (en) | 1979-05-07 |
Family
ID=14834553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12238877A Pending JPS5456361A (en) | 1977-10-14 | 1977-10-14 | Semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5456361A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57126165A (en) * | 1981-01-28 | 1982-08-05 | Nec Home Electronics Ltd | Dhd type glass sealed diode |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51428A (en) * | 1974-06-19 | 1976-01-06 | Kabotsuto Natsuto | Gorufu kurabu |
-
1977
- 1977-10-14 JP JP12238877A patent/JPS5456361A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51428A (en) * | 1974-06-19 | 1976-01-06 | Kabotsuto Natsuto | Gorufu kurabu |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57126165A (en) * | 1981-01-28 | 1982-08-05 | Nec Home Electronics Ltd | Dhd type glass sealed diode |
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