JPS5341180A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5341180A JPS5341180A JP11633876A JP11633876A JPS5341180A JP S5341180 A JPS5341180 A JP S5341180A JP 11633876 A JP11633876 A JP 11633876A JP 11633876 A JP11633876 A JP 11633876A JP S5341180 A JPS5341180 A JP S5341180A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- manufacture
- semiconductor device
- film
- aboid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Dicing (AREA)
Abstract
PURPOSE: To avoid the loss of the substrate at the end area by Al film when the substrate is made into pieces as well as to aboid an exposure of the substrate material using the anode oxide film. Thus, a short circuit can be prevented between the substrate and the lead material when mounting them.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11633876A JPS5341180A (en) | 1976-09-28 | 1976-09-28 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11633876A JPS5341180A (en) | 1976-09-28 | 1976-09-28 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5341180A true JPS5341180A (en) | 1978-04-14 |
Family
ID=14684471
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11633876A Pending JPS5341180A (en) | 1976-09-28 | 1976-09-28 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5341180A (en) |
-
1976
- 1976-09-28 JP JP11633876A patent/JPS5341180A/en active Pending
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