JPS5456356A - Dicing device - Google Patents

Dicing device

Info

Publication number
JPS5456356A
JPS5456356A JP12235577A JP12235577A JPS5456356A JP S5456356 A JPS5456356 A JP S5456356A JP 12235577 A JP12235577 A JP 12235577A JP 12235577 A JP12235577 A JP 12235577A JP S5456356 A JPS5456356 A JP S5456356A
Authority
JP
Japan
Prior art keywords
wafer
base
jig
sucked
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12235577A
Other languages
Japanese (ja)
Inventor
Tsutomu Mimata
Keizo Nomura
Akira Kabashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12235577A priority Critical patent/JPS5456356A/en
Publication of JPS5456356A publication Critical patent/JPS5456356A/en
Pending legal-status Critical Current

Links

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  • Dicing (AREA)

Abstract

PURPOSE: To form a mechanism of not damaging the wafer at the time of removing the wafer after working in a dicing device provided with automatic handling mechanism.
CONSTITUTION: A wafer 10 is sucked to a Verneuil chuck 14 at the state of feeding. When an arm 15 moves and the wafer comes over a base 11, air jetting 20 is stopped and holding is released. The wafer is sucked to the base 11 and is subjected to grooving. After working, a mechanism 13 moves to push the edge of the wafer on the base 11 and transfer the same onto a jig 12. Even if washing solution intervenes between the bottom of the wafer and the face of the base, the wafer can move with extremely small force because the solution is of low viscosity, thus cracking of the wafer does not occur. The moisture between the bottom face of the wafer and the top face of the jig 12 is slight because of a multiplicity of deep grooves 17 on the top of the jig 12. The chuck 14 moves slightly above the wafer and carries the wafer to a desired position by holding the same in the absence of any contact with the bottom of the chuck owing to air jetting 20. Even at this time, the effect of the grooves 17 causes the wafer to be sucked and prevents the same from being cracked
COPYRIGHT: (C)1979,JPO&Japio
JP12235577A 1977-10-14 1977-10-14 Dicing device Pending JPS5456356A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12235577A JPS5456356A (en) 1977-10-14 1977-10-14 Dicing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12235577A JPS5456356A (en) 1977-10-14 1977-10-14 Dicing device

Publications (1)

Publication Number Publication Date
JPS5456356A true JPS5456356A (en) 1979-05-07

Family

ID=14833852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12235577A Pending JPS5456356A (en) 1977-10-14 1977-10-14 Dicing device

Country Status (1)

Country Link
JP (1) JPS5456356A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58127341A (en) * 1982-01-25 1983-07-29 Hitachi Ltd Automatic wafer handling apparatus
JPS58216835A (en) * 1982-05-25 1983-12-16 ウイント・ライツ・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング Automatic conveyor for discoid body
JPS592135U (en) * 1982-06-28 1984-01-09 株式会社東芝 wafer rotation device
JPS5978633U (en) * 1982-11-18 1984-05-28 日立電子エンジニアリング株式会社 Wafer loading/unloading mechanism
JPS62102537A (en) * 1985-10-29 1987-05-13 Canon Inc Substrate processor
JPH03505946A (en) * 1988-06-17 1991-12-19 アドヴァンスド、セミコンダクター・マテリアルズ・アメリカ・インコーポレーテッド Wafer handling system with Bernoulli pickup
CN102738051A (en) * 2012-06-19 2012-10-17 致茂电子(苏州)有限公司 Automatic charging tray moving machine

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58127341A (en) * 1982-01-25 1983-07-29 Hitachi Ltd Automatic wafer handling apparatus
JPS58216835A (en) * 1982-05-25 1983-12-16 ウイント・ライツ・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング Automatic conveyor for discoid body
JPH0325380B2 (en) * 1982-05-25 1991-04-05 Uiruto Raitsu Gmbh
JPS592135U (en) * 1982-06-28 1984-01-09 株式会社東芝 wafer rotation device
JPS626690Y2 (en) * 1982-06-28 1987-02-16
JPS5978633U (en) * 1982-11-18 1984-05-28 日立電子エンジニアリング株式会社 Wafer loading/unloading mechanism
JPS62102537A (en) * 1985-10-29 1987-05-13 Canon Inc Substrate processor
JPH0691150B2 (en) * 1985-10-29 1994-11-14 キヤノン株式会社 Substrate processing method
JPH03505946A (en) * 1988-06-17 1991-12-19 アドヴァンスド、セミコンダクター・マテリアルズ・アメリカ・インコーポレーテッド Wafer handling system with Bernoulli pickup
CN102738051A (en) * 2012-06-19 2012-10-17 致茂电子(苏州)有限公司 Automatic charging tray moving machine

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