JPS5454580A - Cassette chucking device in electron beam lithography apparatus - Google Patents

Cassette chucking device in electron beam lithography apparatus

Info

Publication number
JPS5454580A
JPS5454580A JP12095777A JP12095777A JPS5454580A JP S5454580 A JPS5454580 A JP S5454580A JP 12095777 A JP12095777 A JP 12095777A JP 12095777 A JP12095777 A JP 12095777A JP S5454580 A JPS5454580 A JP S5454580A
Authority
JP
Japan
Prior art keywords
cassette
face
lithographic
chucking device
separating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12095777A
Other languages
Japanese (ja)
Inventor
Yoshimasa Unno
Shinjiro Katagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12095777A priority Critical patent/JPS5454580A/en
Publication of JPS5454580A publication Critical patent/JPS5454580A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To avert damaging of lithographic face by separating the lithographic face from a reference plane at the inserting or removing of a cassette, and letting the cassette be closely contacted softly with a pressing means which is actuated by pressure differences between the atmosphere and vacuum after it has been inserted.
CONSTITUTION: The cassette 6a which is contained in a cassette magazine 10 is inserted into a cassette chucking device 5 with a cassette mounting/dismounting bar 15 after opening an air lock device 8. Next, air is introduced into the space 23 in the device 5 through pipe and through-hole 24 and the casette 6a is pushed up with a leaf spring 26 by extending a bellows 21. This causes a mask 19 to contact the protruding face of a cover 17 and the lithographic face to secure in parallel with the face of a working table 4 within the parallel accuracy of the base 16 and cover 17. In this state, lithography is performed with an electron optical system 1 and if the lthography is finished, the inside of the space 23 is evacuated and the belows 21 is returned to the original state, separating the lithographic face and the reference face. Thereafter, the cassette 6a is removed and is replaced with the next cassette 6b
COPYRIGHT: (C)1979,JPO&Japio
JP12095777A 1977-10-11 1977-10-11 Cassette chucking device in electron beam lithography apparatus Pending JPS5454580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12095777A JPS5454580A (en) 1977-10-11 1977-10-11 Cassette chucking device in electron beam lithography apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12095777A JPS5454580A (en) 1977-10-11 1977-10-11 Cassette chucking device in electron beam lithography apparatus

Publications (1)

Publication Number Publication Date
JPS5454580A true JPS5454580A (en) 1979-04-28

Family

ID=14799163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12095777A Pending JPS5454580A (en) 1977-10-11 1977-10-11 Cassette chucking device in electron beam lithography apparatus

Country Status (1)

Country Link
JP (1) JPS5454580A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55107230A (en) * 1979-02-09 1980-08-16 Jeol Ltd Sample holder in electron ray exposing device and the like
JPS5654037A (en) * 1979-10-08 1981-05-13 Jeol Ltd Sample holder in electron ray exposure device, etc.
JPS5994416A (en) * 1983-10-28 1984-05-31 Hitachi Ltd Supporter for mask
JPS617026U (en) * 1984-06-18 1986-01-16 東芝機械株式会社 Cassette for electron beam lithography equipment
JP2007112509A (en) * 2005-09-22 2007-05-10 Inoac Corp Shock absorbing material for packaging box

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55107230A (en) * 1979-02-09 1980-08-16 Jeol Ltd Sample holder in electron ray exposing device and the like
JPH0142135B2 (en) * 1979-02-09 1989-09-11 Nippon Electron Optics Lab
JPS5654037A (en) * 1979-10-08 1981-05-13 Jeol Ltd Sample holder in electron ray exposure device, etc.
JPH0122726B2 (en) * 1979-10-08 1989-04-27 Nippon Electron Optics Lab
JPS5994416A (en) * 1983-10-28 1984-05-31 Hitachi Ltd Supporter for mask
JPH0158652B2 (en) * 1983-10-28 1989-12-13 Hitachi Ltd
JPS617026U (en) * 1984-06-18 1986-01-16 東芝機械株式会社 Cassette for electron beam lithography equipment
JP2007112509A (en) * 2005-09-22 2007-05-10 Inoac Corp Shock absorbing material for packaging box

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