JPS5438035B2 - - Google Patents

Info

Publication number
JPS5438035B2
JPS5438035B2 JP8411578A JP8411578A JPS5438035B2 JP S5438035 B2 JPS5438035 B2 JP S5438035B2 JP 8411578 A JP8411578 A JP 8411578A JP 8411578 A JP8411578 A JP 8411578A JP S5438035 B2 JPS5438035 B2 JP S5438035B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8411578A
Other versions
JPS5429981A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5429981A publication Critical patent/JPS5429981A/ja
Publication of JPS5438035B2 publication Critical patent/JPS5438035B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
JP8411578A 1977-08-10 1978-07-12 Device for radiating electron beam Granted JPS5429981A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82335277A 1977-08-10 1977-08-10

Publications (2)

Publication Number Publication Date
JPS5429981A JPS5429981A (en) 1979-03-06
JPS5438035B2 true JPS5438035B2 (ja) 1979-11-19

Family

ID=25238513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8411578A Granted JPS5429981A (en) 1977-08-10 1978-07-12 Device for radiating electron beam

Country Status (9)

Country Link
JP (1) JPS5429981A (ja)
BR (1) BR7804994A (ja)
CH (1) CH631574A5 (ja)
DE (1) DE2834391C2 (ja)
FR (1) FR2400256A1 (ja)
GB (1) GB1598219A (ja)
IT (1) IT1112285B (ja)
NL (1) NL7808162A (ja)
SE (1) SE425838B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435173U (ja) * 1977-08-12 1979-03-07
JPS5463681A (en) * 1977-10-29 1979-05-22 Nippon Aviotronics Kk Electron beam exposure device
FR2488043A1 (fr) * 1980-07-30 1982-02-05 Le N Proizv Dispositif a optique electronique pour l'etude d'echantillons
JPS57206173A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Focusing deflecting device for charged corpuscule beam
JPS61183926A (ja) * 1985-02-08 1986-08-16 Toshiba Corp 荷電ビ−ム照射装置
JPS62206828A (ja) * 1986-03-06 1987-09-11 Nec Corp 荷電粒子線描画装置
JPH02246318A (ja) * 1989-03-20 1990-10-02 Fujitsu Ltd 荷電粒子ビーム露光装置
JP2746098B2 (ja) * 1994-01-19 1998-04-28 日本電気株式会社 電子ビーム描画用アパーチャおよび電子ビーム描画方法
JP3206448B2 (ja) 1996-08-30 2001-09-10 日本電気株式会社 電子ビーム描画装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS5357764A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
DE2460716C2 (de) * 1974-12-19 1976-12-30 Siemens Ag Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
CA1166766A (en) * 1977-02-23 1984-05-01 Hans C. Pfeiffer Method and apparatus for forming a variable size electron beam
GB1605087A (en) * 1977-05-31 1981-12-16 Rikagaku Kenkyusho Method for shaping a beam of electrically charged particles

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS5357764A (en) * 1976-11-04 1978-05-25 Fujitsu Ltd Electron beam exposure apparatus

Also Published As

Publication number Publication date
JPS5429981A (en) 1979-03-06
NL7808162A (nl) 1979-02-13
IT7826097A0 (it) 1978-07-26
DE2834391A1 (de) 1979-02-22
CH631574A5 (en) 1982-08-13
FR2400256B1 (ja) 1982-02-05
IT1112285B (it) 1986-01-13
SE7808326L (sv) 1979-02-11
BR7804994A (pt) 1979-04-17
SE425838B (sv) 1982-11-15
SE7808326A (sv) 1979-02-11
GB1598219A (en) 1981-09-16
DE2834391C2 (de) 1986-04-17
FR2400256A1 (fr) 1979-03-09

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