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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Application filed by Mitsubishi Electric CorpfiledCriticalMitsubishi Electric Corp
Priority to JP9937177ApriorityCriticalpatent/JPS5432979A/en
Publication of JPS5432979ApublicationCriticalpatent/JPS5432979A/en
Testing Or Measuring Of Semiconductors Or The Like
(AREA)
Abstract
PURPOSE: To observe the defect distribution of an insulating film on a semiconductor or conductive substrate, by applying the dynamic scattering effect of a liquid crystal.
COPYRIGHT: (C)1979,JPO&Japio
JP9937177A1977-08-181977-08-18Observing method for defect distribution of insulating film
PendingJPS5432979A
(en)