JPS54154966A - Semiconductor electron device - Google Patents
Semiconductor electron deviceInfo
- Publication number
- JPS54154966A JPS54154966A JP6341578A JP6341578A JPS54154966A JP S54154966 A JPS54154966 A JP S54154966A JP 6341578 A JP6341578 A JP 6341578A JP 6341578 A JP6341578 A JP 6341578A JP S54154966 A JPS54154966 A JP S54154966A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- etching
- film
- sio
- laminated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6341578A JPS54154966A (en) | 1978-05-29 | 1978-05-29 | Semiconductor electron device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6341578A JPS54154966A (en) | 1978-05-29 | 1978-05-29 | Semiconductor electron device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54154966A true JPS54154966A (en) | 1979-12-06 |
JPS6228587B2 JPS6228587B2 (enrdf_load_html_response) | 1987-06-22 |
Family
ID=13228627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6341578A Granted JPS54154966A (en) | 1978-05-29 | 1978-05-29 | Semiconductor electron device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54154966A (enrdf_load_html_response) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57211251A (en) * | 1981-06-23 | 1982-12-25 | Toshiba Corp | Manufacture of semiconductor integrated circuit |
JPS59217327A (ja) * | 1983-05-26 | 1984-12-07 | Toshiba Corp | 半導体装置の製造方法 |
JPS62150747A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置 |
JPS63207154A (ja) * | 1987-02-23 | 1988-08-26 | Nec Corp | 半導体装置の製造方法 |
US4980304A (en) * | 1990-02-20 | 1990-12-25 | At&T Bell Laboratories | Process for fabricating a bipolar transistor with a self-aligned contact |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3303071A (en) * | 1964-10-27 | 1967-02-07 | Bell Telephone Labor Inc | Fabrication of a semiconductive device with closely spaced electrodes |
JPS5091288A (enrdf_load_html_response) * | 1973-12-12 | 1975-07-21 | ||
JPS5227355A (en) * | 1975-08-27 | 1977-03-01 | Hitachi Ltd | Diffusion layer formation method |
JPS534469A (en) * | 1977-05-26 | 1978-01-17 | Toshiba Corp | Semiconductor device |
-
1978
- 1978-05-29 JP JP6341578A patent/JPS54154966A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3303071A (en) * | 1964-10-27 | 1967-02-07 | Bell Telephone Labor Inc | Fabrication of a semiconductive device with closely spaced electrodes |
JPS5091288A (enrdf_load_html_response) * | 1973-12-12 | 1975-07-21 | ||
JPS5227355A (en) * | 1975-08-27 | 1977-03-01 | Hitachi Ltd | Diffusion layer formation method |
JPS534469A (en) * | 1977-05-26 | 1978-01-17 | Toshiba Corp | Semiconductor device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57211251A (en) * | 1981-06-23 | 1982-12-25 | Toshiba Corp | Manufacture of semiconductor integrated circuit |
JPS59217327A (ja) * | 1983-05-26 | 1984-12-07 | Toshiba Corp | 半導体装置の製造方法 |
JPS62150747A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置 |
JPS63207154A (ja) * | 1987-02-23 | 1988-08-26 | Nec Corp | 半導体装置の製造方法 |
US4980304A (en) * | 1990-02-20 | 1990-12-25 | At&T Bell Laboratories | Process for fabricating a bipolar transistor with a self-aligned contact |
Also Published As
Publication number | Publication date |
---|---|
JPS6228587B2 (enrdf_load_html_response) | 1987-06-22 |
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