JPS54122983A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS54122983A JPS54122983A JP2989178A JP2989178A JPS54122983A JP S54122983 A JPS54122983 A JP S54122983A JP 2989178 A JP2989178 A JP 2989178A JP 2989178 A JP2989178 A JP 2989178A JP S54122983 A JPS54122983 A JP S54122983A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- dielectric
- anode electrode
- cathode electrode
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
Abstract
PURPOSE: To increase the dielectric strength of lateral type thyristors having three terminals or the like, by forming the electrodes while extending the exposed end of PN junction via the dielectric substance film, in bonding the electrods on the diffusion region placed in the island region of the semiconductor substrate.
CONSTITUTION: In forming the anode electrode 10 and the gate electrode 11 on the three terminal lateral type semiconductor elements such as thyristors, they are bonded on the surface stable film 9 while extending them in excess of the PN junctions J1 to J3 produced with the diffusion region of element. Further, since the cathode electrode 12 has no restriction for the side not opposing to the anode electrode 10, it can freely be extended. Next, the gate electrode 11 is drawn out from the oppoite side of the anode electrode 10 by taking the cathode electrode as the center, and the dielectric strength is increased by extneding the space charge region 13 through the placement of the insulation distance with the cathode electrode 12 to the opposite side of the electrode 10. Further, it is titled to the dielectric film 3 implanting the PN junction J3 caused at the regions 6 and 8 to cause bevel construction.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2989178A JPS54122983A (en) | 1978-03-17 | 1978-03-17 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2989178A JPS54122983A (en) | 1978-03-17 | 1978-03-17 | Semiconductor integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54122983A true JPS54122983A (en) | 1979-09-22 |
JPS6321347B2 JPS6321347B2 (en) | 1988-05-06 |
Family
ID=12288583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2989178A Granted JPS54122983A (en) | 1978-03-17 | 1978-03-17 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54122983A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58102549A (en) * | 1981-12-14 | 1983-06-18 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor ic |
EP0104454A2 (en) * | 1982-08-27 | 1984-04-04 | Hitachi, Ltd. | Semiconductor device with field plate |
JPS61102064A (en) * | 1984-10-25 | 1986-05-20 | Nec Corp | Lateral type p-n-p-n element |
JPS6297374A (en) * | 1985-10-23 | 1987-05-06 | Toko Inc | High withstanding voltage semiconductor device |
US5278076A (en) * | 1990-02-28 | 1994-01-11 | At&T Bell Laboratories | Method of marking a lateral mos controlled thyristor |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3405329A (en) * | 1964-04-16 | 1968-10-08 | Northern Electric Co | Semiconductor devices |
JPS49127576A (en) * | 1973-04-05 | 1974-12-06 | ||
JPS5146880A (en) * | 1974-10-18 | 1976-04-21 | Matsushita Electronics Corp | TORANJISUTA |
JPS5275979A (en) * | 1975-12-22 | 1977-06-25 | Toshiba Corp | Semiconductor device |
-
1978
- 1978-03-17 JP JP2989178A patent/JPS54122983A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3405329A (en) * | 1964-04-16 | 1968-10-08 | Northern Electric Co | Semiconductor devices |
JPS49127576A (en) * | 1973-04-05 | 1974-12-06 | ||
JPS5146880A (en) * | 1974-10-18 | 1976-04-21 | Matsushita Electronics Corp | TORANJISUTA |
JPS5275979A (en) * | 1975-12-22 | 1977-06-25 | Toshiba Corp | Semiconductor device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58102549A (en) * | 1981-12-14 | 1983-06-18 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor ic |
JPH0363221B2 (en) * | 1981-12-14 | 1991-09-30 | Nippon Denshin Denwa Kk | |
EP0104454A2 (en) * | 1982-08-27 | 1984-04-04 | Hitachi, Ltd. | Semiconductor device with field plate |
US4654691A (en) * | 1982-08-27 | 1987-03-31 | Hitachi, Ltd. | Semiconductor device with field plate |
JPS61102064A (en) * | 1984-10-25 | 1986-05-20 | Nec Corp | Lateral type p-n-p-n element |
JPS6297374A (en) * | 1985-10-23 | 1987-05-06 | Toko Inc | High withstanding voltage semiconductor device |
US5278076A (en) * | 1990-02-28 | 1994-01-11 | At&T Bell Laboratories | Method of marking a lateral mos controlled thyristor |
Also Published As
Publication number | Publication date |
---|---|
JPS6321347B2 (en) | 1988-05-06 |
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