JPS54134937A - Manufacture of magnetic bubble chip - Google Patents

Manufacture of magnetic bubble chip

Info

Publication number
JPS54134937A
JPS54134937A JP4262878A JP4262878A JPS54134937A JP S54134937 A JPS54134937 A JP S54134937A JP 4262878 A JP4262878 A JP 4262878A JP 4262878 A JP4262878 A JP 4262878A JP S54134937 A JPS54134937 A JP S54134937A
Authority
JP
Japan
Prior art keywords
insulator film
electric insulator
magnetic bubble
pattern
permalloy pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4262878A
Other languages
Japanese (ja)
Inventor
Niwaji Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4262878A priority Critical patent/JPS54134937A/en
Publication of JPS54134937A publication Critical patent/JPS54134937A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To fix a Permalloy pattern away from the surface of a magnetic bubble wafer at an adequate interval, by etching an electric insulator film at a specific part among places where the Permalloy pattern should be formed.
CONSTITUTION: On wafer 1 of a magnetic bubble material, the 1st electric insulator film 2 as a space layer, the 2nd electric insulator film 4 formed on the entire surface including conductor pattern 3 as control wiring of a generator, a gate, a replicator, etc., and Permalloy pattern 5 for a transfer path, the gate, the replicator, a detector, etc., are formed. Before the formation of Permalloy pattern 5, the 1st electric insulator film 2 and/or the 2nd electric insulator film 4 at specific parts amoug places where the Permalloy pattern 5 is formed are/is etched.
COPYRIGHT: (C)1979,JPO&Japio
JP4262878A 1978-04-13 1978-04-13 Manufacture of magnetic bubble chip Pending JPS54134937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4262878A JPS54134937A (en) 1978-04-13 1978-04-13 Manufacture of magnetic bubble chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4262878A JPS54134937A (en) 1978-04-13 1978-04-13 Manufacture of magnetic bubble chip

Publications (1)

Publication Number Publication Date
JPS54134937A true JPS54134937A (en) 1979-10-19

Family

ID=12641270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4262878A Pending JPS54134937A (en) 1978-04-13 1978-04-13 Manufacture of magnetic bubble chip

Country Status (1)

Country Link
JP (1) JPS54134937A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56143585A (en) * 1980-04-09 1981-11-09 Nec Corp Magnetic bubble element
JPS58177585A (en) * 1982-04-09 1983-10-18 Hitachi Ltd Magnetic bubble memory element
JPS6074192A (en) * 1983-09-30 1985-04-26 Fujitsu Ltd Method for forming bubble memory

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56143585A (en) * 1980-04-09 1981-11-09 Nec Corp Magnetic bubble element
JPS58177585A (en) * 1982-04-09 1983-10-18 Hitachi Ltd Magnetic bubble memory element
JPS6074192A (en) * 1983-09-30 1985-04-26 Fujitsu Ltd Method for forming bubble memory

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