Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP2000476ApriorityCriticalpatent/JPS52104068A/en
Publication of JPS52104068ApublicationCriticalpatent/JPS52104068A/en
PURPOSE: To perform etching of insulation film owing to mask being formed by covering Si layer and selectively peeling off, through a posi type photo resist insulation film.
COPYRIGHT: (C)1977,JPO&Japio
JP2000476A1976-02-271976-02-27Production of semiconductor device
PendingJPS52104068A
(en)