JPS5315788A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5315788A
JPS5315788A JP9055076A JP9055076A JPS5315788A JP S5315788 A JPS5315788 A JP S5315788A JP 9055076 A JP9055076 A JP 9055076A JP 9055076 A JP9055076 A JP 9055076A JP S5315788 A JPS5315788 A JP S5315788A
Authority
JP
Japan
Prior art keywords
elements
production
semiconductor device
make
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9055076A
Other languages
Japanese (ja)
Inventor
Katsuteru Awane
Tatsuo Morita
Masaru Okuno
Hiroshi Hashimoto
Hiroshi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP9055076A priority Critical patent/JPS5315788A/en
Publication of JPS5315788A publication Critical patent/JPS5315788A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To make isolation among elements perfect and prevent disconnection by perfectly oxidizing the exposed portions of a semiconductor substrate to increase their volume and make the substrate flush to element forming regions, then forming elements and performing wirings among elements through the oxidized surface.
COPYRIGHT: (C)1978,JPO&Japio
JP9055076A 1976-07-28 1976-07-28 Production of semiconductor device Pending JPS5315788A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9055076A JPS5315788A (en) 1976-07-28 1976-07-28 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9055076A JPS5315788A (en) 1976-07-28 1976-07-28 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5315788A true JPS5315788A (en) 1978-02-14

Family

ID=14001511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9055076A Pending JPS5315788A (en) 1976-07-28 1976-07-28 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5315788A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754346A (en) * 1980-09-18 1982-03-31 Matsushita Electronics Corp Formation of polycrystalline silicon wiring layer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49135586A (en) * 1973-04-28 1974-12-27

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49135586A (en) * 1973-04-28 1974-12-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754346A (en) * 1980-09-18 1982-03-31 Matsushita Electronics Corp Formation of polycrystalline silicon wiring layer

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