JPS52127172A - Semiconductor device and its manufacture - Google Patents
Semiconductor device and its manufactureInfo
- Publication number
- JPS52127172A JPS52127172A JP4452176A JP4452176A JPS52127172A JP S52127172 A JPS52127172 A JP S52127172A JP 4452176 A JP4452176 A JP 4452176A JP 4452176 A JP4452176 A JP 4452176A JP S52127172 A JPS52127172 A JP S52127172A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- sio
- enduring
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To form a flat surface, to prevent a break of a metallic wiring path and, moreover, to make leakage current small by coating a material for a mask enduring etching of a SiO2 film on the SiO2 layer for insulation separation.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4452176A JPS52127172A (en) | 1976-04-19 | 1976-04-19 | Semiconductor device and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4452176A JPS52127172A (en) | 1976-04-19 | 1976-04-19 | Semiconductor device and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52127172A true JPS52127172A (en) | 1977-10-25 |
JPS6159537B2 JPS6159537B2 (en) | 1986-12-17 |
Family
ID=12693832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4452176A Granted JPS52127172A (en) | 1976-04-19 | 1976-04-19 | Semiconductor device and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52127172A (en) |
-
1976
- 1976-04-19 JP JP4452176A patent/JPS52127172A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6159537B2 (en) | 1986-12-17 |
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