JPS541245A - Method of etching a1 and a1-based alloy - Google Patents

Method of etching a1 and a1-based alloy

Info

Publication number
JPS541245A
JPS541245A JP6576977A JP6576977A JPS541245A JP S541245 A JPS541245 A JP S541245A JP 6576977 A JP6576977 A JP 6576977A JP 6576977 A JP6576977 A JP 6576977A JP S541245 A JPS541245 A JP S541245A
Authority
JP
Japan
Prior art keywords
etching
based alloy
percision
circuitting
undercutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6576977A
Other languages
Japanese (ja)
Other versions
JPS556108B2 (en
Inventor
Shinya Iida
Tatsumi Mizutani
Hideo Komatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6576977A priority Critical patent/JPS541245A/en
Publication of JPS541245A publication Critical patent/JPS541245A/en
Publication of JPS556108B2 publication Critical patent/JPS556108B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To accomplish a high speed, percision etching without undercutting through sputter-etching of a photoresist-masked Al-evaporated plate for circuitting on a semi-conductive substrate with a gas containing boron trichloride.
JP6576977A 1977-06-06 1977-06-06 Method of etching a1 and a1-based alloy Granted JPS541245A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6576977A JPS541245A (en) 1977-06-06 1977-06-06 Method of etching a1 and a1-based alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6576977A JPS541245A (en) 1977-06-06 1977-06-06 Method of etching a1 and a1-based alloy

Publications (2)

Publication Number Publication Date
JPS541245A true JPS541245A (en) 1979-01-08
JPS556108B2 JPS556108B2 (en) 1980-02-13

Family

ID=13296552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6576977A Granted JPS541245A (en) 1977-06-06 1977-06-06 Method of etching a1 and a1-based alloy

Country Status (1)

Country Link
JP (1) JPS541245A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55107780A (en) * 1979-02-07 1980-08-19 Hitachi Ltd Etching method
JPS55115928A (en) * 1979-02-27 1980-09-06 Kawasaki Steel Corp Production of non-aging cold rolled steel plate of excellent deep drawability
JPS5726143A (en) * 1980-07-25 1982-02-12 Kawasaki Steel Corp Cold rolled steel plate for pressing with very low intrasurface anisotropy and its manufacture
US5356493A (en) * 1992-07-08 1994-10-18 Nkk Corporation Blister-resistant steel sheet and method for producing thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3994793A (en) * 1975-05-22 1976-11-30 International Business Machines Corporation Reactive ion etching of aluminum
JPS5236979A (en) * 1975-09-18 1977-03-22 Itt Method of etching
JPS52123938A (en) * 1976-04-13 1977-10-18 Fujitsu Ltd Spatter etching method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3994793A (en) * 1975-05-22 1976-11-30 International Business Machines Corporation Reactive ion etching of aluminum
JPS5236979A (en) * 1975-09-18 1977-03-22 Itt Method of etching
JPS52123938A (en) * 1976-04-13 1977-10-18 Fujitsu Ltd Spatter etching method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55107780A (en) * 1979-02-07 1980-08-19 Hitachi Ltd Etching method
JPS5637306B2 (en) * 1979-02-07 1981-08-29
JPS55115928A (en) * 1979-02-27 1980-09-06 Kawasaki Steel Corp Production of non-aging cold rolled steel plate of excellent deep drawability
US4339284A (en) * 1979-02-27 1982-07-13 Kawasaki Steel Corporation Method of producing non-ageing cold rolled steel sheets
JPS5849627B2 (en) * 1979-02-27 1983-11-05 川崎製鉄株式会社 Method for producing non-temporal cold-rolled steel sheet
JPS5726143A (en) * 1980-07-25 1982-02-12 Kawasaki Steel Corp Cold rolled steel plate for pressing with very low intrasurface anisotropy and its manufacture
JPS61888B2 (en) * 1980-07-25 1986-01-11 Kawasaki Steel Co
US5356493A (en) * 1992-07-08 1994-10-18 Nkk Corporation Blister-resistant steel sheet and method for producing thereof

Also Published As

Publication number Publication date
JPS556108B2 (en) 1980-02-13

Similar Documents

Publication Publication Date Title
JPS5244173A (en) Method of flat etching of silicon substrate
JPS52155420A (en) Gas enclosing method for enclosing type cylinder
JPS541245A (en) Method of etching a1 and a1-based alloy
FR2335693A1 (en) METHOD AND DEVICE FOR PRODUCING DIRECTIONAL CURRENTS FROM COMPRESSIBLE FLUIDS AT HIGH SPEEDS, ESPECIALLY FOR GAS TURBINES
JPS5389374A (en) Production of semiconductor device
JPS5387668A (en) Forming method of patterns
JPS52104063A (en) Production of surface protection film in electronic parts
JPS53135843A (en) Etching process for al and al alloy
JPS53105371A (en) Crystal growing method for potassium arsenide
JPS5436695A (en) Laser processing method
JPS51111056A (en) Diffused layer forming method
JPS5240070A (en) Process for production of semiconductor device
JPS5341177A (en) Mounting method of electronic parts
JPS5321573A (en) Etching method
JPS5261475A (en) Production of silicon crystal film
JPS53143242A (en) Production of optical diffusing plate
JPS5343450A (en) High-speed order process unit
JPS5225573A (en) Thin film formation method
JPS52127174A (en) Minute patern formation method
JPS5429987A (en) Forming method of selective vapor-deposition film
JPS53117029A (en) Vibration insulation
JPS5234482A (en) Cutting tool
JPS53123089A (en) Production of semiconductor device
JPS53132260A (en) Production of semiconductor device
JPS5231662A (en) Cleavage method of crystal thin plate