JPS54108580A - Electron-beam exposure device - Google Patents

Electron-beam exposure device

Info

Publication number
JPS54108580A
JPS54108580A JP1570978A JP1570978A JPS54108580A JP S54108580 A JPS54108580 A JP S54108580A JP 1570978 A JP1570978 A JP 1570978A JP 1570978 A JP1570978 A JP 1570978A JP S54108580 A JPS54108580 A JP S54108580A
Authority
JP
Japan
Prior art keywords
beams
section
length
passing
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1570978A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231488B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Nobuo Goto
Masaru Ohashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN filed Critical Jeol Ltd
Priority to JP1570978A priority Critical patent/JPS54108580A/ja
Publication of JPS54108580A publication Critical patent/JPS54108580A/ja
Publication of JPS6231488B2 publication Critical patent/JPS6231488B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP1570978A 1978-02-13 1978-02-13 Electron-beam exposure device Granted JPS54108580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1570978A JPS54108580A (en) 1978-02-13 1978-02-13 Electron-beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1570978A JPS54108580A (en) 1978-02-13 1978-02-13 Electron-beam exposure device

Publications (2)

Publication Number Publication Date
JPS54108580A true JPS54108580A (en) 1979-08-25
JPS6231488B2 JPS6231488B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-08

Family

ID=11896286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1570978A Granted JPS54108580A (en) 1978-02-13 1978-02-13 Electron-beam exposure device

Country Status (1)

Country Link
JP (1) JPS54108580A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683029A (en) * 1979-12-11 1981-07-07 Jeol Ltd Adjusting method of beam measurement
JPS5760841A (en) * 1980-09-30 1982-04-13 Toshiba Corp Exposure device for electron beam
JPS62295419A (ja) * 1987-05-29 1987-12-22 Toshiba Corp 電子ビ−ム露光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683029A (en) * 1979-12-11 1981-07-07 Jeol Ltd Adjusting method of beam measurement
JPS5760841A (en) * 1980-09-30 1982-04-13 Toshiba Corp Exposure device for electron beam
JPS62295419A (ja) * 1987-05-29 1987-12-22 Toshiba Corp 電子ビ−ム露光装置

Also Published As

Publication number Publication date
JPS6231488B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-08

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