JPS5676153A - Image signal processor for scanning electron microscope - Google Patents
Image signal processor for scanning electron microscopeInfo
- Publication number
- JPS5676153A JPS5676153A JP15203779A JP15203779A JPS5676153A JP S5676153 A JPS5676153 A JP S5676153A JP 15203779 A JP15203779 A JP 15203779A JP 15203779 A JP15203779 A JP 15203779A JP S5676153 A JPS5676153 A JP S5676153A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- image signal
- deflection
- counters
- signal processor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To improve the accuracy and the speed of processing, by setting a plurality of regions in a scanning picture face while setting the scanning speed and the data take-in time for each region. CONSTITUTION:A timing control circuit 13 will produce counts for coordinate counters 14, 15, sample pulse for sample hold 22, a reset signal 55 for an integrator 21, an integrating section signal 57, a converting instruction for AD converter 59, etc. in accordance with input clock. The output from the coordinate counters 14, 15 will form the deflection signal through DA counters 16, 17. The deflection signal will deflect the electron beam 7 of a microscope through amplifiers 80, 81 while used for the deflection of CRT23 through amplifiers 82, 83. The picture image signal obtained from a detector 9 is integrated in an integrating circuit 22 then provided to CRT23 while simultaneously provided through AD converter 24 and an interface 10 to a computor 100.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15203779A JPS5676153A (en) | 1979-11-26 | 1979-11-26 | Image signal processor for scanning electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15203779A JPS5676153A (en) | 1979-11-26 | 1979-11-26 | Image signal processor for scanning electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5676153A true JPS5676153A (en) | 1981-06-23 |
JPS6231780B2 JPS6231780B2 (en) | 1987-07-10 |
Family
ID=15531668
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15203779A Granted JPS5676153A (en) | 1979-11-26 | 1979-11-26 | Image signal processor for scanning electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5676153A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62254350A (en) * | 1986-04-03 | 1987-11-06 | Kumagai Nobuaki | Improving method for sn ratio of digital scanning image in scanning type electron microscope |
JP2002251975A (en) * | 2001-02-26 | 2002-09-06 | Hitachi Ltd | Inspection device using electron beam and inspection method using electron beam |
WO2017090204A1 (en) * | 2015-11-27 | 2017-06-01 | 株式会社日立ハイテクノロジーズ | Charged particle beam device and image processing method in charged particle beam device |
JP2018206779A (en) * | 2013-04-27 | 2018-12-27 | ケーエルエー−テンカー コーポレイション | Method and system for adaptively scanning sample during electron beam inspection |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4702472B2 (en) * | 2009-07-28 | 2011-06-15 | 株式会社日立製作所 | Inspection method and inspection apparatus using electron beam |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5014272A (en) * | 1973-06-06 | 1975-02-14 | ||
JPS5019494A (en) * | 1973-05-09 | 1975-02-28 |
-
1979
- 1979-11-26 JP JP15203779A patent/JPS5676153A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5019494A (en) * | 1973-05-09 | 1975-02-28 | ||
JPS5014272A (en) * | 1973-06-06 | 1975-02-14 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62254350A (en) * | 1986-04-03 | 1987-11-06 | Kumagai Nobuaki | Improving method for sn ratio of digital scanning image in scanning type electron microscope |
JPH0528465B2 (en) * | 1986-04-03 | 1993-04-26 | Oosaka Daigakucho | |
JP2002251975A (en) * | 2001-02-26 | 2002-09-06 | Hitachi Ltd | Inspection device using electron beam and inspection method using electron beam |
JP2018206779A (en) * | 2013-04-27 | 2018-12-27 | ケーエルエー−テンカー コーポレイション | Method and system for adaptively scanning sample during electron beam inspection |
WO2017090204A1 (en) * | 2015-11-27 | 2017-06-01 | 株式会社日立ハイテクノロジーズ | Charged particle beam device and image processing method in charged particle beam device |
JPWO2017090204A1 (en) * | 2015-11-27 | 2018-08-30 | 株式会社日立ハイテクノロジーズ | Charged particle beam apparatus and image processing method in charged particle beam apparatus |
US10522325B2 (en) | 2015-11-27 | 2019-12-31 | Hitachi High-Technologies Corporation | Charged particle beam device and image processing method in charged particle beam device |
US10763078B2 (en) | 2015-11-27 | 2020-09-01 | Hitachi High-Tech Corporation | Charged particle beam device and image processing method in charged particle beam device |
Also Published As
Publication number | Publication date |
---|---|
JPS6231780B2 (en) | 1987-07-10 |
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