JPS54108581A - Electron-beam exposure device - Google Patents

Electron-beam exposure device

Info

Publication number
JPS54108581A
JPS54108581A JP1571078A JP1571078A JPS54108581A JP S54108581 A JPS54108581 A JP S54108581A JP 1571078 A JP1571078 A JP 1571078A JP 1571078 A JP1571078 A JP 1571078A JP S54108581 A JPS54108581 A JP S54108581A
Authority
JP
Japan
Prior art keywords
deflection
electron beams
section
electron
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1571078A
Other languages
Japanese (ja)
Other versions
JPS5616543B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Nobuo Goto
Masaru Ohashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP1571078A priority Critical patent/JPS54108581A/en
Publication of JPS54108581A publication Critical patent/JPS54108581A/en
Publication of JPS5616543B2 publication Critical patent/JPS5616543B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain electron beams of the section desirable in size invariably, by correcting a length signal of side Y corresponding to the variation of the length signal of side X of electron beams of the reactangular section. CONSTITUTION:By the command of computer 4, register 5 attain D/A conversion 6 and amplification 7 of a signal to make deflection (dxdy), and gate 14 is opened to reset counter 23. Clock pulse CP18 after being gated 14, counted 15 and D/A-converted 16 is amplified 17 and deflection- scanned 13, so that wire 10 will be irradiated with electron beams at a constant speed. Primary and secondary differential processes 20 and 21 of an electron-beam current decreasing gradually are performed to generate 22 pulses of the pulse width equal to the interval between secondary differential signal peaks and, in consequence, gate 27 is opened to count 23 CPs, so that its discrete value will be stored in comparator 24. Next, when side Y is changed with side X of the beam section kept constant, a deflection component is generated in the X direction with side Y not in parallel to deflection direction (dy). Therefore, CP discrete value 23 at this time is compared 24 with the stored value, the difference is D/A-converted 25 for matrix control 26, and deflection in the X direction is made with the polarity inverted. Consequently, the section of electron beams passing through mask (m2) becomes desirable in size.
JP1571078A 1978-02-13 1978-02-13 Electron-beam exposure device Granted JPS54108581A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1571078A JPS54108581A (en) 1978-02-13 1978-02-13 Electron-beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1571078A JPS54108581A (en) 1978-02-13 1978-02-13 Electron-beam exposure device

Publications (2)

Publication Number Publication Date
JPS54108581A true JPS54108581A (en) 1979-08-25
JPS5616543B2 JPS5616543B2 (en) 1981-04-16

Family

ID=11896315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1571078A Granted JPS54108581A (en) 1978-02-13 1978-02-13 Electron-beam exposure device

Country Status (1)

Country Link
JP (1) JPS54108581A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760841A (en) * 1980-09-30 1982-04-13 Toshiba Corp Exposure device for electron beam

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5895370U (en) * 1981-12-22 1983-06-28 井関農機株式会社 Operating device in mobile vehicle

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50105381A (en) * 1974-01-28 1975-08-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50105381A (en) * 1974-01-28 1975-08-20

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760841A (en) * 1980-09-30 1982-04-13 Toshiba Corp Exposure device for electron beam

Also Published As

Publication number Publication date
JPS5616543B2 (en) 1981-04-16

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