JPS54101390A - Foreign matter inspector - Google Patents

Foreign matter inspector

Info

Publication number
JPS54101390A
JPS54101390A JP727778A JP727778A JPS54101390A JP S54101390 A JPS54101390 A JP S54101390A JP 727778 A JP727778 A JP 727778A JP 727778 A JP727778 A JP 727778A JP S54101390 A JPS54101390 A JP S54101390A
Authority
JP
Japan
Prior art keywords
reflected light
polarizing plate
semiconductor wafer
detected
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP727778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6330570B2 (enrdf_load_stackoverflow
Inventor
Masakuni Akiba
Hiroto Nagatomo
Jun Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP727778A priority Critical patent/JPS54101390A/ja
Priority to US06/005,924 priority patent/US4342515A/en
Priority to DE19792903072 priority patent/DE2903072A1/de
Publication of JPS54101390A publication Critical patent/JPS54101390A/ja
Publication of JPS6330570B2 publication Critical patent/JPS6330570B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP727778A 1978-01-27 1978-01-27 Foreign matter inspector Granted JPS54101390A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP727778A JPS54101390A (en) 1978-01-27 1978-01-27 Foreign matter inspector
US06/005,924 US4342515A (en) 1978-01-27 1979-01-23 Method of inspecting the surface of an object and apparatus therefor
DE19792903072 DE2903072A1 (de) 1978-01-27 1979-01-26 Vorrichtung und verfahren zur oberflaechenpruefung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP727778A JPS54101390A (en) 1978-01-27 1978-01-27 Foreign matter inspector

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP13715884A Division JPS60122360A (ja) 1984-07-04 1984-07-04 光学検査装置
JP13715784A Division JPS60122359A (ja) 1984-07-04 1984-07-04 光学検査装置

Publications (2)

Publication Number Publication Date
JPS54101390A true JPS54101390A (en) 1979-08-09
JPS6330570B2 JPS6330570B2 (enrdf_load_stackoverflow) 1988-06-20

Family

ID=11661526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP727778A Granted JPS54101390A (en) 1978-01-27 1978-01-27 Foreign matter inspector

Country Status (1)

Country Link
JP (1) JPS54101390A (enrdf_load_stackoverflow)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5686340A (en) * 1979-12-17 1981-07-14 Hitachi Ltd Automatic detector for foreign matter
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance
JPS58110041A (ja) * 1981-12-23 1983-06-30 Fujitsu Ltd パタ−ン検査方法
JPS58122411A (ja) * 1982-01-11 1983-07-21 Japan Crown Cork Co Ltd 基板上の被覆における不規則を検出する方法及び装置
JPS6015939A (ja) * 1983-07-08 1985-01-26 Hitachi Ltd 異物検査装置
JPS60251681A (ja) * 1984-05-29 1985-12-12 Hitachi Electronics Eng Co Ltd 表面弾性波フイルタ用ウエハの検査装置
JPS6211140A (ja) * 1985-06-28 1987-01-20 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS6211148A (ja) * 1985-06-28 1987-01-20 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS6275336A (ja) * 1985-09-30 1987-04-07 Hitachi Electronics Eng Co Ltd 異物検査装置
US5410400A (en) * 1991-06-26 1995-04-25 Hitachi, Ltd. Foreign particle inspection apparatus
US5801965A (en) * 1993-12-28 1998-09-01 Hitachi, Ltd. Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
US6064477A (en) * 1993-02-26 2000-05-16 Hitachi, Ltd. Method of and apparatus for inspecting reticle for defects
US6366690B1 (en) 1998-07-07 2002-04-02 Applied Materials, Inc. Pixel based machine for patterned wafers
US6546308B2 (en) 1993-12-28 2003-04-08 Hitachi, Ltd, Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04130694U (ja) * 1991-05-21 1992-11-30 ワイケイケイアーキテクチユラルプロダクツ株式会社 上吊式引戸

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112183A (en) * 1974-08-12 1976-10-04 Mitsubishi Electric Corp Diffraction pattern detector
JPS52138183A (en) * 1976-05-14 1977-11-18 Toshiba Corp Inspecting apparatus for flaw

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51112183A (en) * 1974-08-12 1976-10-04 Mitsubishi Electric Corp Diffraction pattern detector
JPS52138183A (en) * 1976-05-14 1977-11-18 Toshiba Corp Inspecting apparatus for flaw

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5686340A (en) * 1979-12-17 1981-07-14 Hitachi Ltd Automatic detector for foreign matter
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance
JPS58110041A (ja) * 1981-12-23 1983-06-30 Fujitsu Ltd パタ−ン検査方法
JPS58122411A (ja) * 1982-01-11 1983-07-21 Japan Crown Cork Co Ltd 基板上の被覆における不規則を検出する方法及び装置
JPS6015939A (ja) * 1983-07-08 1985-01-26 Hitachi Ltd 異物検査装置
JPS60251681A (ja) * 1984-05-29 1985-12-12 Hitachi Electronics Eng Co Ltd 表面弾性波フイルタ用ウエハの検査装置
JPS6211140A (ja) * 1985-06-28 1987-01-20 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS6211148A (ja) * 1985-06-28 1987-01-20 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS6275336A (ja) * 1985-09-30 1987-04-07 Hitachi Electronics Eng Co Ltd 異物検査装置
US5410400A (en) * 1991-06-26 1995-04-25 Hitachi, Ltd. Foreign particle inspection apparatus
US6084664A (en) * 1992-11-30 2000-07-04 Hitachi, Ltd. Method of and apparatus for inspecting reticle for defects
US6064477A (en) * 1993-02-26 2000-05-16 Hitachi, Ltd. Method of and apparatus for inspecting reticle for defects
US5801965A (en) * 1993-12-28 1998-09-01 Hitachi, Ltd. Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
US6438438B1 (en) 1993-12-28 2002-08-20 Hitachi, Ltd. Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
US6546308B2 (en) 1993-12-28 2003-04-08 Hitachi, Ltd, Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
US6366690B1 (en) 1998-07-07 2002-04-02 Applied Materials, Inc. Pixel based machine for patterned wafers
US6810139B2 (en) 1998-07-07 2004-10-26 Applied Materials, Inc. Pixel based machine for patterned wafers
US7016526B2 (en) 1998-07-07 2006-03-21 Applied Materials, Inc. Pixel based machine for patterned wafers
US7454052B2 (en) 1998-07-07 2008-11-18 Applied Materials, Inc. Pixel based machine for patterned wafers

Also Published As

Publication number Publication date
JPS6330570B2 (enrdf_load_stackoverflow) 1988-06-20

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