JPS5391085A - Deposition apparatus of gas phase chemical reaction substance utilized plasma discharge - Google Patents

Deposition apparatus of gas phase chemical reaction substance utilized plasma discharge

Info

Publication number
JPS5391085A
JPS5391085A JP592977A JP592977A JPS5391085A JP S5391085 A JPS5391085 A JP S5391085A JP 592977 A JP592977 A JP 592977A JP 592977 A JP592977 A JP 592977A JP S5391085 A JPS5391085 A JP S5391085A
Authority
JP
Japan
Prior art keywords
gas phase
chemical reaction
deposition apparatus
plasma discharge
phase chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP592977A
Other languages
Japanese (ja)
Other versions
JPS5940906B2 (en
Inventor
Tatsu Ito
Katsuo Sugawara
Takeo Yoshimi
Atsushi Hiraiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP592977A priority Critical patent/JPS5940906B2/en
Publication of JPS5391085A publication Critical patent/JPS5391085A/en
Publication of JPS5940906B2 publication Critical patent/JPS5940906B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:The above mentioned apparatus, having uniform quality of membrane in radius direction of wafer and enable to form equal quality and thickness of membrane, is obtained by curving the face of shower part, so as the central part to be far and circumference part to be near at a space between shower part, jetting one kind raw material gas and wafer face.
JP592977A 1977-01-24 1977-01-24 Gas-phase chemical reactant precipitation device using plasma discharge Expired JPS5940906B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP592977A JPS5940906B2 (en) 1977-01-24 1977-01-24 Gas-phase chemical reactant precipitation device using plasma discharge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP592977A JPS5940906B2 (en) 1977-01-24 1977-01-24 Gas-phase chemical reactant precipitation device using plasma discharge

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP8944584A Division JPS59219464A (en) 1984-05-07 1984-05-07 Vapor phase chemical reaction method

Publications (2)

Publication Number Publication Date
JPS5391085A true JPS5391085A (en) 1978-08-10
JPS5940906B2 JPS5940906B2 (en) 1984-10-03

Family

ID=11624571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP592977A Expired JPS5940906B2 (en) 1977-01-24 1977-01-24 Gas-phase chemical reactant precipitation device using plasma discharge

Country Status (1)

Country Link
JP (1) JPS5940906B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5773174A (en) * 1980-10-24 1982-05-07 Semiconductor Energy Lab Co Ltd Manufacturing apparatus for coating film
JPS57123363A (en) * 1981-01-23 1982-07-31 Nat Jutaku Kenzai Footboard for staircase
JPS618409U (en) * 1984-06-18 1986-01-18 英治 佐々木 Oil element with handle for easy extraction
US5346578A (en) * 1992-11-04 1994-09-13 Novellus Systems, Inc. Induction plasma source
US6225744B1 (en) 1992-11-04 2001-05-01 Novellus Systems, Inc. Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63296102A (en) * 1987-05-28 1988-12-02 Toshiba Corp Plant control system

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5773174A (en) * 1980-10-24 1982-05-07 Semiconductor Energy Lab Co Ltd Manufacturing apparatus for coating film
JPH0325928B2 (en) * 1980-10-24 1991-04-09 Handotai Energy Kenkyusho
JPS57123363A (en) * 1981-01-23 1982-07-31 Nat Jutaku Kenzai Footboard for staircase
JPS618409U (en) * 1984-06-18 1986-01-18 英治 佐々木 Oil element with handle for easy extraction
US5346578A (en) * 1992-11-04 1994-09-13 Novellus Systems, Inc. Induction plasma source
US5405480A (en) * 1992-11-04 1995-04-11 Novellus Systems, Inc. Induction plasma source
US5605599A (en) * 1992-11-04 1997-02-25 Novellus Systems, Inc. Method of generating plasma having high ion density for substrate processing operation
US6225744B1 (en) 1992-11-04 2001-05-01 Novellus Systems, Inc. Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil

Also Published As

Publication number Publication date
JPS5940906B2 (en) 1984-10-03

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