JPS51137682A - Gas phase ch emical reaction system - Google Patents

Gas phase ch emical reaction system

Info

Publication number
JPS51137682A
JPS51137682A JP6106775A JP6106775A JPS51137682A JP S51137682 A JPS51137682 A JP S51137682A JP 6106775 A JP6106775 A JP 6106775A JP 6106775 A JP6106775 A JP 6106775A JP S51137682 A JPS51137682 A JP S51137682A
Authority
JP
Japan
Prior art keywords
gas phase
reaction system
emical
emical reaction
membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6106775A
Other languages
Japanese (ja)
Other versions
JPS5810988B2 (en
Inventor
Tadashi Suda
Tetsukazu Hashimoto
Katsumi Takami
Chiaki Shinpo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50061067A priority Critical patent/JPS5810988B2/en
Publication of JPS51137682A publication Critical patent/JPS51137682A/en
Publication of JPS5810988B2 publication Critical patent/JPS5810988B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:A gas phase chemical reaction system preventing ununiformity of membrane due to clouding of substrate and forming high quality membrane.
JP50061067A 1975-05-23 1975-05-23 The basics Expired JPS5810988B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50061067A JPS5810988B2 (en) 1975-05-23 1975-05-23 The basics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50061067A JPS5810988B2 (en) 1975-05-23 1975-05-23 The basics

Publications (2)

Publication Number Publication Date
JPS51137682A true JPS51137682A (en) 1976-11-27
JPS5810988B2 JPS5810988B2 (en) 1983-02-28

Family

ID=13160424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50061067A Expired JPS5810988B2 (en) 1975-05-23 1975-05-23 The basics

Country Status (1)

Country Link
JP (1) JPS5810988B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54154291A (en) * 1978-05-25 1979-12-05 Itt Method of forming aliminum conductor path

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4932827A (en) * 1972-07-27 1974-03-26

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4932827A (en) * 1972-07-27 1974-03-26

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54154291A (en) * 1978-05-25 1979-12-05 Itt Method of forming aliminum conductor path
JPH0234166B2 (en) * 1978-05-25 1990-08-01 Itt

Also Published As

Publication number Publication date
JPS5810988B2 (en) 1983-02-28

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