JPS52143980A - Equipment for plasma deposition - Google Patents

Equipment for plasma deposition

Info

Publication number
JPS52143980A
JPS52143980A JP6024976A JP6024976A JPS52143980A JP S52143980 A JPS52143980 A JP S52143980A JP 6024976 A JP6024976 A JP 6024976A JP 6024976 A JP6024976 A JP 6024976A JP S52143980 A JPS52143980 A JP S52143980A
Authority
JP
Japan
Prior art keywords
equipment
plasma deposition
gases
damageless
defectless
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6024976A
Other languages
Japanese (ja)
Other versions
JPS5914543B2 (en
Inventor
Masahiko Nakamae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6024976A priority Critical patent/JPS5914543B2/en
Publication of JPS52143980A publication Critical patent/JPS52143980A/en
Publication of JPS5914543B2 publication Critical patent/JPS5914543B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To obtain the uniform and damageless or defectless membrane, by forming the prescribed reaction product on the substrate by making react plural number of gases with each other after the above gases have been made to plasma respectively.
JP6024976A 1976-05-25 1976-05-25 plasma deposition equipment Expired JPS5914543B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6024976A JPS5914543B2 (en) 1976-05-25 1976-05-25 plasma deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6024976A JPS5914543B2 (en) 1976-05-25 1976-05-25 plasma deposition equipment

Publications (2)

Publication Number Publication Date
JPS52143980A true JPS52143980A (en) 1977-11-30
JPS5914543B2 JPS5914543B2 (en) 1984-04-05

Family

ID=13136706

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6024976A Expired JPS5914543B2 (en) 1976-05-25 1976-05-25 plasma deposition equipment

Country Status (1)

Country Link
JP (1) JPS5914543B2 (en)

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56501132A (en) * 1979-09-20 1981-08-13
JPS59148326A (en) * 1983-02-14 1984-08-25 Sumitomo Electric Ind Ltd Fabrication of thin film by cvd method
JPS6041047A (en) * 1983-08-16 1985-03-04 Canon Inc Formation of deposited film
JPS6042765A (en) * 1983-08-17 1985-03-07 Canon Inc Formation of deposited film
JPS6043489A (en) * 1984-07-04 1985-03-08 Hitachi Ltd Molecular ray deposition device
JPS6188521A (en) * 1984-10-08 1986-05-06 Canon Inc Formation of deposited film
JPS61183924A (en) * 1985-02-09 1986-08-16 Canon Inc Formation of deposited film
JPS61184818A (en) * 1985-02-12 1986-08-18 Canon Inc Formation of deposited film
JPS61184817A (en) * 1985-02-12 1986-08-18 Canon Inc Formation of deposited film
JPS61189628A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61189629A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61189625A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61189626A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61191022A (en) * 1985-02-20 1986-08-25 Canon Inc Formation of deposited film
JPS61190924A (en) * 1985-02-19 1986-08-25 Canon Inc Formation of deposited film
JPS61191021A (en) * 1985-02-20 1986-08-25 Canon Inc Formation of deposited film
JPS61190925A (en) * 1985-02-19 1986-08-25 Canon Inc Formation of deposited film
JPS61191024A (en) * 1985-02-20 1986-08-25 Canon Inc Formation of deposited film
JPS61193431A (en) * 1985-02-21 1986-08-27 Canon Inc Formation of deposited film
JPS61193430A (en) * 1985-02-21 1986-08-27 Canon Inc Formation of deposited film
JPS61193429A (en) * 1985-02-22 1986-08-27 Canon Inc Formation of deposited film
JPS61193425A (en) * 1985-02-21 1986-08-27 Canon Inc Formation of deposited film
JPS61194709A (en) * 1985-02-22 1986-08-29 Canon Inc Formation of deposited film
JPS61194820A (en) * 1985-02-25 1986-08-29 Canon Inc Deposited film forming method
JPS61194819A (en) * 1985-02-25 1986-08-29 Canon Inc Deposited film forming method
JPS61194711A (en) * 1985-02-22 1986-08-29 Canon Inc Formation of deposited film
JPS61194818A (en) * 1985-02-25 1986-08-29 Canon Inc Deposited film forming method
JPS61194710A (en) * 1985-02-22 1986-08-29 Canon Inc Formation of deposited film
JPS61196520A (en) * 1985-02-26 1986-08-30 Canon Inc Deposition film forming method
JPS61196518A (en) * 1985-02-26 1986-08-30 Canon Inc Deposition film forming method
JPS61198621A (en) * 1985-02-27 1986-09-03 Canon Inc Formation of deposited film
JPS61198618A (en) * 1985-02-28 1986-09-03 Canon Inc Formation of deposited film
JPS61276977A (en) * 1985-05-30 1986-12-06 Canon Inc Formation of deposited film
JPS6240717A (en) * 1985-08-15 1987-02-21 Canon Inc Accumulated film forming method and device
US4835005A (en) * 1983-08-16 1989-05-30 Canon Kabushiki Kaishi Process for forming deposition film

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56501132A (en) * 1979-09-20 1981-08-13
JPS59148326A (en) * 1983-02-14 1984-08-25 Sumitomo Electric Ind Ltd Fabrication of thin film by cvd method
US4835005A (en) * 1983-08-16 1989-05-30 Canon Kabushiki Kaishi Process for forming deposition film
JPS6041047A (en) * 1983-08-16 1985-03-04 Canon Inc Formation of deposited film
US5645947A (en) * 1983-08-16 1997-07-08 Canon Kabushiki Kaisha Silicon-containing deposited film
JPH0360917B2 (en) * 1983-08-16 1991-09-18 Canon Kk
JPS6042765A (en) * 1983-08-17 1985-03-07 Canon Inc Formation of deposited film
JPH0372710B2 (en) * 1983-08-17 1991-11-19 Canon Kk
JPS6229508B2 (en) * 1984-07-04 1987-06-26 Hitachi Ltd
JPS6043489A (en) * 1984-07-04 1985-03-08 Hitachi Ltd Molecular ray deposition device
JPS6188521A (en) * 1984-10-08 1986-05-06 Canon Inc Formation of deposited film
JPS61183924A (en) * 1985-02-09 1986-08-16 Canon Inc Formation of deposited film
JPS61184818A (en) * 1985-02-12 1986-08-18 Canon Inc Formation of deposited film
JPS61184817A (en) * 1985-02-12 1986-08-18 Canon Inc Formation of deposited film
JPS61189629A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61189626A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61189625A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61189628A (en) * 1985-02-18 1986-08-23 Canon Inc Formation of deposited film
JPS61190925A (en) * 1985-02-19 1986-08-25 Canon Inc Formation of deposited film
JPS61190924A (en) * 1985-02-19 1986-08-25 Canon Inc Formation of deposited film
JPS61191021A (en) * 1985-02-20 1986-08-25 Canon Inc Formation of deposited film
JPS61191024A (en) * 1985-02-20 1986-08-25 Canon Inc Formation of deposited film
JPS61191022A (en) * 1985-02-20 1986-08-25 Canon Inc Formation of deposited film
JPS61193431A (en) * 1985-02-21 1986-08-27 Canon Inc Formation of deposited film
JPS61193430A (en) * 1985-02-21 1986-08-27 Canon Inc Formation of deposited film
JPS61193425A (en) * 1985-02-21 1986-08-27 Canon Inc Formation of deposited film
JPS61194709A (en) * 1985-02-22 1986-08-29 Canon Inc Formation of deposited film
JPS61194711A (en) * 1985-02-22 1986-08-29 Canon Inc Formation of deposited film
JPS61194710A (en) * 1985-02-22 1986-08-29 Canon Inc Formation of deposited film
JPS61193429A (en) * 1985-02-22 1986-08-27 Canon Inc Formation of deposited film
JPS61194818A (en) * 1985-02-25 1986-08-29 Canon Inc Deposited film forming method
JPS61194819A (en) * 1985-02-25 1986-08-29 Canon Inc Deposited film forming method
JPS61194820A (en) * 1985-02-25 1986-08-29 Canon Inc Deposited film forming method
JPS61196520A (en) * 1985-02-26 1986-08-30 Canon Inc Deposition film forming method
JPS61196518A (en) * 1985-02-26 1986-08-30 Canon Inc Deposition film forming method
JPS61198621A (en) * 1985-02-27 1986-09-03 Canon Inc Formation of deposited film
JPS61198618A (en) * 1985-02-28 1986-09-03 Canon Inc Formation of deposited film
JPS61276977A (en) * 1985-05-30 1986-12-06 Canon Inc Formation of deposited film
JPS6240717A (en) * 1985-08-15 1987-02-21 Canon Inc Accumulated film forming method and device

Also Published As

Publication number Publication date
JPS5914543B2 (en) 1984-04-05

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