JPS5389381A - Production of integrated circuit - Google Patents
Production of integrated circuitInfo
- Publication number
- JPS5389381A JPS5389381A JP288977A JP288977A JPS5389381A JP S5389381 A JPS5389381 A JP S5389381A JP 288977 A JP288977 A JP 288977A JP 288977 A JP288977 A JP 288977A JP S5389381 A JPS5389381 A JP S5389381A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- impurity concentration
- production
- integrated circuit
- high impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To obtain minute and flat contacts by selectively depositing a Si layer of a low impurity concentration on a Si layer of a high impurity concentration, and leaving thick SiO2 films on the high impurity concentration layer through low temperature wet oxidation by a self-alignment method.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP288977A JPS5389381A (en) | 1977-01-17 | 1977-01-17 | Production of integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP288977A JPS5389381A (en) | 1977-01-17 | 1977-01-17 | Production of integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5389381A true JPS5389381A (en) | 1978-08-05 |
Family
ID=11541913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP288977A Pending JPS5389381A (en) | 1977-01-17 | 1977-01-17 | Production of integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5389381A (en) |
-
1977
- 1977-01-17 JP JP288977A patent/JPS5389381A/en active Pending
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