JPS5375770A - X-ray copying mask - Google Patents

X-ray copying mask

Info

Publication number
JPS5375770A
JPS5375770A JP15090076A JP15090076A JPS5375770A JP S5375770 A JPS5375770 A JP S5375770A JP 15090076 A JP15090076 A JP 15090076A JP 15090076 A JP15090076 A JP 15090076A JP S5375770 A JPS5375770 A JP S5375770A
Authority
JP
Japan
Prior art keywords
mask
ray
copying mask
high accuracy
ray copying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15090076A
Other languages
English (en)
Japanese (ja)
Other versions
JPS545265B2 (show.php
Inventor
Kayao Takemoto
Masaru Miyazaki
Yasunao Saito
Yoshiaki Mimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NTT Inc
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP15090076A priority Critical patent/JPS5375770A/ja
Publication of JPS5375770A publication Critical patent/JPS5375770A/ja
Publication of JPS545265B2 publication Critical patent/JPS545265B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15090076A 1976-12-17 1976-12-17 X-ray copying mask Granted JPS5375770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15090076A JPS5375770A (en) 1976-12-17 1976-12-17 X-ray copying mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15090076A JPS5375770A (en) 1976-12-17 1976-12-17 X-ray copying mask

Publications (2)

Publication Number Publication Date
JPS5375770A true JPS5375770A (en) 1978-07-05
JPS545265B2 JPS545265B2 (show.php) 1979-03-15

Family

ID=15506826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15090076A Granted JPS5375770A (en) 1976-12-17 1976-12-17 X-ray copying mask

Country Status (1)

Country Link
JP (1) JPS5375770A (show.php)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56132343A (en) * 1980-03-22 1981-10-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask for x-ray exposure and its manufacture
JPS58207635A (ja) * 1982-05-28 1983-12-03 Seiko Epson Corp メンブラン・マスクの製造方法
US4708919A (en) * 1985-08-02 1987-11-24 Micronix Corporation Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959575A (show.php) * 1972-06-29 1974-06-10
JPS50120270A (show.php) * 1974-02-15 1975-09-20

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959575A (show.php) * 1972-06-29 1974-06-10
JPS50120270A (show.php) * 1974-02-15 1975-09-20

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56132343A (en) * 1980-03-22 1981-10-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask for x-ray exposure and its manufacture
JPS58207635A (ja) * 1982-05-28 1983-12-03 Seiko Epson Corp メンブラン・マスクの製造方法
US4708919A (en) * 1985-08-02 1987-11-24 Micronix Corporation Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure

Also Published As

Publication number Publication date
JPS545265B2 (show.php) 1979-03-15

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