JPS5368978A - Etching method - Google Patents

Etching method

Info

Publication number
JPS5368978A
JPS5368978A JP14509576A JP14509576A JPS5368978A JP S5368978 A JPS5368978 A JP S5368978A JP 14509576 A JP14509576 A JP 14509576A JP 14509576 A JP14509576 A JP 14509576A JP S5368978 A JPS5368978 A JP S5368978A
Authority
JP
Japan
Prior art keywords
etching method
atmosphere
etching
mattern
fidelity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14509576A
Other languages
Japanese (ja)
Inventor
Toshio Yada
Atsushi Endo
Yuri Shima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14509576A priority Critical patent/JPS5368978A/en
Publication of JPS5368978A publication Critical patent/JPS5368978A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To make possible deep etching with fidelity to patterns by defining the gas pressure range of an atmosphere at the time of providing a mask mattern on the metal to be etched and performing sputter etching in the mixed atmosphere of chlorine and oxygen.
COPYRIGHT: (C)1978,JPO&Japio
JP14509576A 1976-12-01 1976-12-01 Etching method Pending JPS5368978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14509576A JPS5368978A (en) 1976-12-01 1976-12-01 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14509576A JPS5368978A (en) 1976-12-01 1976-12-01 Etching method

Publications (1)

Publication Number Publication Date
JPS5368978A true JPS5368978A (en) 1978-06-19

Family

ID=15377247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14509576A Pending JPS5368978A (en) 1976-12-01 1976-12-01 Etching method

Country Status (1)

Country Link
JP (1) JPS5368978A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4360414A (en) * 1980-12-05 1982-11-23 Siemens Aktiengesellschaft Method of producing structures comprised of layers consisting of silicides or silicide-polysilicon by reactive sputter etching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4360414A (en) * 1980-12-05 1982-11-23 Siemens Aktiengesellschaft Method of producing structures comprised of layers consisting of silicides or silicide-polysilicon by reactive sputter etching

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