JPS5368577A - Removing method of positive type photo resist - Google Patents

Removing method of positive type photo resist

Info

Publication number
JPS5368577A
JPS5368577A JP14334276A JP14334276A JPS5368577A JP S5368577 A JPS5368577 A JP S5368577A JP 14334276 A JP14334276 A JP 14334276A JP 14334276 A JP14334276 A JP 14334276A JP S5368577 A JPS5368577 A JP S5368577A
Authority
JP
Japan
Prior art keywords
positive type
type photo
photo resist
removing method
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14334276A
Other languages
Japanese (ja)
Inventor
Toshiharu Matsuzawa
Hiroshi Yanagisawa
Kikuo Doda
Nobuo Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14334276A priority Critical patent/JPS5368577A/en
Publication of JPS5368577A publication Critical patent/JPS5368577A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE: To insure safety without using phenol or the like being powerful matter by radiating ultraviolet rays over the entire surface before removing positive type photo resist thereafter eremoving the resist with an organic solvent having been controlled to basic by making use of the characteristic that the positive type photo resist of the sensitized portion dissolves in a basic solution.
COPYRIGHT: (C)1978,JPO&Japio
JP14334276A 1976-12-01 1976-12-01 Removing method of positive type photo resist Pending JPS5368577A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14334276A JPS5368577A (en) 1976-12-01 1976-12-01 Removing method of positive type photo resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14334276A JPS5368577A (en) 1976-12-01 1976-12-01 Removing method of positive type photo resist

Publications (1)

Publication Number Publication Date
JPS5368577A true JPS5368577A (en) 1978-06-19

Family

ID=15336548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14334276A Pending JPS5368577A (en) 1976-12-01 1976-12-01 Removing method of positive type photo resist

Country Status (1)

Country Link
JP (1) JPS5368577A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06188540A (en) * 1984-03-07 1994-07-08 Ciba Geigy Ag Image forming method
US20170042038A1 (en) * 2014-03-14 2017-02-09 Jsr Corporation Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device
JP2020155721A (en) * 2019-03-22 2020-09-24 株式会社Ｓｃｒｅｅｎホールディングス Substrate treatment method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06188540A (en) * 1984-03-07 1994-07-08 Ciba Geigy Ag Image forming method
US20170042038A1 (en) * 2014-03-14 2017-02-09 Jsr Corporation Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device
US9980392B2 (en) * 2014-03-14 2018-05-22 Jsr Corporation Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device
JP2020155721A (en) * 2019-03-22 2020-09-24 株式会社Ｓｃｒｅｅｎホールディングス Substrate treatment method
WO2020195176A1 (en) * 2019-03-22 2020-10-01 株式会社Ｓｃｒｅｅｎホールディングス Substrate treatment method

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