JPS5355978A - Vaccuum type vapor growth device - Google Patents
Vaccuum type vapor growth deviceInfo
- Publication number
- JPS5355978A JPS5355978A JP13087276A JP13087276A JPS5355978A JP S5355978 A JPS5355978 A JP S5355978A JP 13087276 A JP13087276 A JP 13087276A JP 13087276 A JP13087276 A JP 13087276A JP S5355978 A JPS5355978 A JP S5355978A
- Authority
- JP
- Japan
- Prior art keywords
- vaccuum
- growth device
- vapor growth
- type vapor
- core tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To secure an easy removal of a furnace core tube as well as to obtain a thin film of reduced pinhole on the substrate, by providing an auxiliary furnace core tube containing a guide rail within the furnace core tube which shust out the open air and also providing a tray on which a boat is put onto the guide rail.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13087276A JPS5355978A (en) | 1976-10-29 | 1976-10-29 | Vaccuum type vapor growth device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13087276A JPS5355978A (en) | 1976-10-29 | 1976-10-29 | Vaccuum type vapor growth device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5355978A true JPS5355978A (en) | 1978-05-20 |
Family
ID=15044659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13087276A Pending JPS5355978A (en) | 1976-10-29 | 1976-10-29 | Vaccuum type vapor growth device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5355978A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5628636A (en) * | 1979-08-15 | 1981-03-20 | Mitsubishi Electric Corp | Cvd film forming apparatus |
JPS60129133U (en) * | 1984-02-07 | 1985-08-30 | 株式会社日立国際電気 | Quartz boat for oxide film production |
JPH04180619A (en) * | 1990-11-15 | 1992-06-26 | Nec Yamagata Ltd | Horizontal type reactor for semiconductor manufacturing |
CN111455354A (en) * | 2020-05-22 | 2020-07-28 | 湖南红太阳光电科技有限公司 | Boat inlet and outlet device of tubular PECVD (plasma enhanced chemical vapor deposition) equipment and tubular PECVD equipment |
-
1976
- 1976-10-29 JP JP13087276A patent/JPS5355978A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5628636A (en) * | 1979-08-15 | 1981-03-20 | Mitsubishi Electric Corp | Cvd film forming apparatus |
JPS6348838B2 (en) * | 1979-08-15 | 1988-09-30 | Mitsubishi Denki Kk | |
JPS60129133U (en) * | 1984-02-07 | 1985-08-30 | 株式会社日立国際電気 | Quartz boat for oxide film production |
JPH0227563Y2 (en) * | 1984-02-07 | 1990-07-25 | ||
JPH04180619A (en) * | 1990-11-15 | 1992-06-26 | Nec Yamagata Ltd | Horizontal type reactor for semiconductor manufacturing |
CN111455354A (en) * | 2020-05-22 | 2020-07-28 | 湖南红太阳光电科技有限公司 | Boat inlet and outlet device of tubular PECVD (plasma enhanced chemical vapor deposition) equipment and tubular PECVD equipment |
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