JPS5628636A - Cvd film forming apparatus - Google Patents
Cvd film forming apparatusInfo
- Publication number
- JPS5628636A JPS5628636A JP10387379A JP10387379A JPS5628636A JP S5628636 A JPS5628636 A JP S5628636A JP 10387379 A JP10387379 A JP 10387379A JP 10387379 A JP10387379 A JP 10387379A JP S5628636 A JPS5628636 A JP S5628636A
- Authority
- JP
- Japan
- Prior art keywords
- reaction pipe
- films
- silicon wafers
- forming apparatus
- removable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE: To make removal of a reaction pipe for the purpose of cleaning easy and make the film thickness of the formed film uniform by inserting another one reaction pipe which is removable, to the inner side of the reaction pipe.
CONSTITUTION: In a diffusion furnace type CVD film forming apparatus consisting of a reaction pipe 1, a boat 2, silicon wafers 3, a gas inlet 5, an outlet 6 and mounting fittings 7, 8, a removable another one reaction pipe 9 is inserted into the reaction pipe 1. In the case of forming CVD films on the silicon wafers 3, the uniformity of the formed film thicknesses depend most largely upon the difference between wafer diameters and the inside diameter of the reaction pipe; therefore, the thicknesses of the formed films may be made uniform simply by replacing the inner reaction pipe 9 depending upon the sizes of the silicon wafers 3 and the need for cumbersome replacement of the reaction pipe 1 in the prior art may be eliminated. This apparatus is effective for the case of forming SiO2 films by combination of SiH4 and O2 particularly at low temperatures.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10387379A JPS5628636A (en) | 1979-08-15 | 1979-08-15 | Cvd film forming apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10387379A JPS5628636A (en) | 1979-08-15 | 1979-08-15 | Cvd film forming apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5628636A true JPS5628636A (en) | 1981-03-20 |
JPS6348838B2 JPS6348838B2 (en) | 1988-09-30 |
Family
ID=14365546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10387379A Granted JPS5628636A (en) | 1979-08-15 | 1979-08-15 | Cvd film forming apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5628636A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61111992A (en) * | 1984-11-05 | 1986-05-30 | Rohm Co Ltd | Vacuum gaseous-phase growth device |
JPWO2019124098A1 (en) * | 2017-12-22 | 2020-08-20 | 株式会社村田製作所 | Film deposition equipment |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5355978A (en) * | 1976-10-29 | 1978-05-20 | Nec Corp | Vaccuum type vapor growth device |
-
1979
- 1979-08-15 JP JP10387379A patent/JPS5628636A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5355978A (en) * | 1976-10-29 | 1978-05-20 | Nec Corp | Vaccuum type vapor growth device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61111992A (en) * | 1984-11-05 | 1986-05-30 | Rohm Co Ltd | Vacuum gaseous-phase growth device |
JPH0336794B2 (en) * | 1984-11-05 | 1991-06-03 | Rohm Kk | |
JPWO2019124098A1 (en) * | 2017-12-22 | 2020-08-20 | 株式会社村田製作所 | Film deposition equipment |
JP2022033870A (en) * | 2017-12-22 | 2022-03-02 | 株式会社村田製作所 | Film deposition apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6348838B2 (en) | 1988-09-30 |
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