JPS5628636A - Cvd film forming apparatus - Google Patents

Cvd film forming apparatus

Info

Publication number
JPS5628636A
JPS5628636A JP10387379A JP10387379A JPS5628636A JP S5628636 A JPS5628636 A JP S5628636A JP 10387379 A JP10387379 A JP 10387379A JP 10387379 A JP10387379 A JP 10387379A JP S5628636 A JPS5628636 A JP S5628636A
Authority
JP
Japan
Prior art keywords
reaction pipe
films
silicon wafers
forming apparatus
removable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10387379A
Other languages
Japanese (ja)
Other versions
JPS6348838B2 (en
Inventor
Hiroshi Isaji
Seishi Izumi
Kazuo Kobayashi
Haruo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Mitsubishi Electric Corp
Original Assignee
Tokyo Electron Ltd
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Mitsubishi Electric Corp filed Critical Tokyo Electron Ltd
Priority to JP10387379A priority Critical patent/JPS5628636A/en
Publication of JPS5628636A publication Critical patent/JPS5628636A/en
Publication of JPS6348838B2 publication Critical patent/JPS6348838B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE: To make removal of a reaction pipe for the purpose of cleaning easy and make the film thickness of the formed film uniform by inserting another one reaction pipe which is removable, to the inner side of the reaction pipe.
CONSTITUTION: In a diffusion furnace type CVD film forming apparatus consisting of a reaction pipe 1, a boat 2, silicon wafers 3, a gas inlet 5, an outlet 6 and mounting fittings 7, 8, a removable another one reaction pipe 9 is inserted into the reaction pipe 1. In the case of forming CVD films on the silicon wafers 3, the uniformity of the formed film thicknesses depend most largely upon the difference between wafer diameters and the inside diameter of the reaction pipe; therefore, the thicknesses of the formed films may be made uniform simply by replacing the inner reaction pipe 9 depending upon the sizes of the silicon wafers 3 and the need for cumbersome replacement of the reaction pipe 1 in the prior art may be eliminated. This apparatus is effective for the case of forming SiO2 films by combination of SiH4 and O2 particularly at low temperatures.
COPYRIGHT: (C)1981,JPO&Japio
JP10387379A 1979-08-15 1979-08-15 Cvd film forming apparatus Granted JPS5628636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10387379A JPS5628636A (en) 1979-08-15 1979-08-15 Cvd film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10387379A JPS5628636A (en) 1979-08-15 1979-08-15 Cvd film forming apparatus

Publications (2)

Publication Number Publication Date
JPS5628636A true JPS5628636A (en) 1981-03-20
JPS6348838B2 JPS6348838B2 (en) 1988-09-30

Family

ID=14365546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10387379A Granted JPS5628636A (en) 1979-08-15 1979-08-15 Cvd film forming apparatus

Country Status (1)

Country Link
JP (1) JPS5628636A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61111992A (en) * 1984-11-05 1986-05-30 Rohm Co Ltd Vacuum gaseous-phase growth device
JPWO2019124098A1 (en) * 2017-12-22 2020-08-20 株式会社村田製作所 Film deposition equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5355978A (en) * 1976-10-29 1978-05-20 Nec Corp Vaccuum type vapor growth device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5355978A (en) * 1976-10-29 1978-05-20 Nec Corp Vaccuum type vapor growth device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61111992A (en) * 1984-11-05 1986-05-30 Rohm Co Ltd Vacuum gaseous-phase growth device
JPH0336794B2 (en) * 1984-11-05 1991-06-03 Rohm Kk
JPWO2019124098A1 (en) * 2017-12-22 2020-08-20 株式会社村田製作所 Film deposition equipment
JP2022033870A (en) * 2017-12-22 2022-03-02 株式会社村田製作所 Film deposition apparatus

Also Published As

Publication number Publication date
JPS6348838B2 (en) 1988-09-30

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