JPS5331974A - Mask for exposure - Google Patents

Mask for exposure

Info

Publication number
JPS5331974A
JPS5331974A JP10650776A JP10650776A JPS5331974A JP S5331974 A JPS5331974 A JP S5331974A JP 10650776 A JP10650776 A JP 10650776A JP 10650776 A JP10650776 A JP 10650776A JP S5331974 A JPS5331974 A JP S5331974A
Authority
JP
Japan
Prior art keywords
mask
thin
exposure
layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10650776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5427237B2 (enExample
Inventor
Toshiki Kadota
Toshiro Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP10650776A priority Critical patent/JPS5331974A/ja
Publication of JPS5331974A publication Critical patent/JPS5331974A/ja
Publication of JPS5427237B2 publication Critical patent/JPS5427237B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10650776A 1976-09-06 1976-09-06 Mask for exposure Granted JPS5331974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10650776A JPS5331974A (en) 1976-09-06 1976-09-06 Mask for exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10650776A JPS5331974A (en) 1976-09-06 1976-09-06 Mask for exposure

Publications (2)

Publication Number Publication Date
JPS5331974A true JPS5331974A (en) 1978-03-25
JPS5427237B2 JPS5427237B2 (enExample) 1979-09-08

Family

ID=14435331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10650776A Granted JPS5331974A (en) 1976-09-06 1976-09-06 Mask for exposure

Country Status (1)

Country Link
JP (1) JPS5331974A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02129910A (ja) * 1988-11-09 1990-05-18 Mitsubishi Electric Corp Ｘ線露光用マスク

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52100872A (en) * 1976-02-19 1977-08-24 Nec Corp Fabrication of mask for x-ray exposure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52100872A (en) * 1976-02-19 1977-08-24 Nec Corp Fabrication of mask for x-ray exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02129910A (ja) * 1988-11-09 1990-05-18 Mitsubishi Electric Corp Ｘ線露光用マスク

Also Published As

Publication number Publication date
JPS5427237B2 (enExample) 1979-09-08

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