JPS5299780A - Production of silicon mask for x-ray lithography - Google Patents

Production of silicon mask for x-ray lithography

Info

Publication number
JPS5299780A
JPS5299780A JP1670276A JP1670276A JPS5299780A JP S5299780 A JPS5299780 A JP S5299780A JP 1670276 A JP1670276 A JP 1670276A JP 1670276 A JP1670276 A JP 1670276A JP S5299780 A JPS5299780 A JP S5299780A
Authority
JP
Japan
Prior art keywords
ray lithography
production
silicon mask
substrate
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1670276A
Other languages
Japanese (ja)
Inventor
Jiyunji Matsui
Hidekazu Okabayashi
Daizaburo Shinoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1670276A priority Critical patent/JPS5299780A/en
Publication of JPS5299780A publication Critical patent/JPS5299780A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To produce a Si mask for X-ray lithography by providing a high-concentration O2-implanted layer having a required concentration peak at an arbitrary depth in a Si substrate, depositing heavy metal films thereon and etching the substrate from its rear surface down to the O2-implanted layer.
COPYRIGHT: (C)1977,JPO&Japio
JP1670276A 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography Pending JPS5299780A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1670276A JPS5299780A (en) 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1670276A JPS5299780A (en) 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography

Publications (1)

Publication Number Publication Date
JPS5299780A true JPS5299780A (en) 1977-08-22

Family

ID=11923608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1670276A Pending JPS5299780A (en) 1976-02-18 1976-02-18 Production of silicon mask for x-ray lithography

Country Status (1)

Country Link
JP (1) JPS5299780A (en)

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