Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
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Filing date
Publication date
Application filed by Oki Electric Industry Co LtdfiledCriticalOki Electric Industry Co Ltd
Priority to JP9129776ApriorityCriticalpatent/JPS5317277A/en
Publication of JPS5317277ApublicationCriticalpatent/JPS5317277A/en
Preparing Plates And Mask In Photomechanical Process
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Abstract
PURPOSE: To shorten mask production time by separately performing drawing of the portions where repetitive patterns are less and drawing of the portions where repetitive patterns are extremely many.
COPYRIGHT: (C)1978,JPO&Japio
JP9129776A1976-08-021976-08-02Production of mask for semiconductor integrated circuit
PendingJPS5317277A
(en)