JPS5313879A - Silicon mask for x-ray exposure and its production - Google Patents
Silicon mask for x-ray exposure and its productionInfo
- Publication number
- JPS5313879A JPS5313879A JP8796876A JP8796876A JPS5313879A JP S5313879 A JPS5313879 A JP S5313879A JP 8796876 A JP8796876 A JP 8796876A JP 8796876 A JP8796876 A JP 8796876A JP S5313879 A JPS5313879 A JP S5313879A
- Authority
- JP
- Japan
- Prior art keywords
- ray exposure
- production
- silicon mask
- ray
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8796876A JPS5313879A (en) | 1976-07-23 | 1976-07-23 | Silicon mask for x-ray exposure and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8796876A JPS5313879A (en) | 1976-07-23 | 1976-07-23 | Silicon mask for x-ray exposure and its production |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5313879A true JPS5313879A (en) | 1978-02-07 |
JPS541625B2 JPS541625B2 (th) | 1979-01-26 |
Family
ID=13929643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8796876A Granted JPS5313879A (en) | 1976-07-23 | 1976-07-23 | Silicon mask for x-ray exposure and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5313879A (th) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55127559A (en) * | 1979-03-26 | 1980-10-02 | Fujitsu Ltd | Blank mask for x-ray exposure and using method therefor |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5057656A (th) * | 1973-09-17 | 1975-05-20 | ||
JPS52117558A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Soft x-ray exposure mask and its manufacturing method |
-
1976
- 1976-07-23 JP JP8796876A patent/JPS5313879A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5057656A (th) * | 1973-09-17 | 1975-05-20 | ||
JPS52117558A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Soft x-ray exposure mask and its manufacturing method |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55127559A (en) * | 1979-03-26 | 1980-10-02 | Fujitsu Ltd | Blank mask for x-ray exposure and using method therefor |
JPS625332B2 (th) * | 1979-03-26 | 1987-02-04 | Fujitsu Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS541625B2 (th) | 1979-01-26 |
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