JPS53110482A - Non-volatile semiconductor memory element and its production - Google Patents
Non-volatile semiconductor memory element and its productionInfo
- Publication number
- JPS53110482A JPS53110482A JP2628477A JP2628477A JPS53110482A JP S53110482 A JPS53110482 A JP S53110482A JP 2628477 A JP2628477 A JP 2628477A JP 2628477 A JP2628477 A JP 2628477A JP S53110482 A JPS53110482 A JP S53110482A
- Authority
- JP
- Japan
- Prior art keywords
- memory element
- production
- semiconductor memory
- volatile semiconductor
- trap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Non-Volatile Memory (AREA)
Abstract
PURPOSE:To make a memory element of uniform characteristics by implanting impurity ions of groups III or V in the specified positions within the insulation film over the intermediate region of source and drain thereby making a trap.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2628477A JPS53110482A (en) | 1977-03-09 | 1977-03-09 | Non-volatile semiconductor memory element and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2628477A JPS53110482A (en) | 1977-03-09 | 1977-03-09 | Non-volatile semiconductor memory element and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53110482A true JPS53110482A (en) | 1978-09-27 |
Family
ID=12188980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2628477A Pending JPS53110482A (en) | 1977-03-09 | 1977-03-09 | Non-volatile semiconductor memory element and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53110482A (en) |
-
1977
- 1977-03-09 JP JP2628477A patent/JPS53110482A/en active Pending
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