JPS53108765A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS53108765A JPS53108765A JP2362977A JP2362977A JPS53108765A JP S53108765 A JPS53108765 A JP S53108765A JP 2362977 A JP2362977 A JP 2362977A JP 2362977 A JP2362977 A JP 2362977A JP S53108765 A JPS53108765 A JP S53108765A
- Authority
- JP
- Japan
- Prior art keywords
- layers
- diffusion
- production
- semiconductor device
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To obtain diffused layers of a small surface impurity concentration with good accuracy by forming extremely shallow diffusion layers by phosphorus stoms in a Si substrate, oxidizing the layers by the water having heated the substrate surface, thereafter applying one or several times of etching to chip off the surface to provide diffusion sources and performing drive-in diffusion by using this.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2362977A JPS53108765A (en) | 1977-03-04 | 1977-03-04 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2362977A JPS53108765A (en) | 1977-03-04 | 1977-03-04 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53108765A true JPS53108765A (en) | 1978-09-21 |
Family
ID=12115872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2362977A Pending JPS53108765A (en) | 1977-03-04 | 1977-03-04 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53108765A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5952475B1 (en) * | 2015-08-11 | 2016-07-13 | 直江津電子工業株式会社 | Diffusion wafer and manufacturing method thereof |
-
1977
- 1977-03-04 JP JP2362977A patent/JPS53108765A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5952475B1 (en) * | 2015-08-11 | 2016-07-13 | 直江津電子工業株式会社 | Diffusion wafer and manufacturing method thereof |
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