JPS53100767A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS53100767A JPS53100767A JP1456277A JP1456277A JPS53100767A JP S53100767 A JPS53100767 A JP S53100767A JP 1456277 A JP1456277 A JP 1456277A JP 1456277 A JP1456277 A JP 1456277A JP S53100767 A JPS53100767 A JP S53100767A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- diffusion
- wafers
- putting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE: To make uniform products through quick diffusion by putting the wafers to be subjected to emitter diffusion under a temperature distribution in which the temperature changes nearly uniformly along their arraying direction in performing diffusion.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1456277A JPS5839375B2 (en) | 1977-02-15 | 1977-02-15 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1456277A JPS5839375B2 (en) | 1977-02-15 | 1977-02-15 | Manufacturing method of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53100767A true JPS53100767A (en) | 1978-09-02 |
JPS5839375B2 JPS5839375B2 (en) | 1983-08-30 |
Family
ID=11864585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1456277A Expired JPS5839375B2 (en) | 1977-02-15 | 1977-02-15 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5839375B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5824788A (en) * | 1981-08-07 | 1983-02-14 | 真空理工株式会社 | Temperature dradient furnace |
JPH02132822A (en) * | 1988-11-14 | 1990-05-22 | Mitsumi Electric Co Ltd | Manufacture of semiconductor device |
JPH0547685A (en) * | 1991-08-07 | 1993-02-26 | Rohm Co Ltd | Method of diffusing impurity to semiconductor wafer |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6146770A (en) * | 1984-08-14 | 1986-03-07 | Fuji Heavy Ind Ltd | Side rail round structure in automobile |
-
1977
- 1977-02-15 JP JP1456277A patent/JPS5839375B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5824788A (en) * | 1981-08-07 | 1983-02-14 | 真空理工株式会社 | Temperature dradient furnace |
JPS625272B2 (en) * | 1981-08-07 | 1987-02-04 | Shinku Riko Kk | |
JPH02132822A (en) * | 1988-11-14 | 1990-05-22 | Mitsumi Electric Co Ltd | Manufacture of semiconductor device |
JPH0547685A (en) * | 1991-08-07 | 1993-02-26 | Rohm Co Ltd | Method of diffusing impurity to semiconductor wafer |
Also Published As
Publication number | Publication date |
---|---|
JPS5839375B2 (en) | 1983-08-30 |
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