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Hitachi Ltd
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Hitachi Ltd
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Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP1489276ApriorityCriticalpatent/JPS5299077A/en
Publication of JPS5299077ApublicationCriticalpatent/JPS5299077A/en
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
Abstract
PURPOSE:To make possible treatment of a multiplicity of wafers through one evaporation by making the mask fixing jig for evaporation smaller in size, in performing evaporation on silicon wafers using metal masks.