JPS5261955A - Method of making silicon single crystal bar doped with phosphorus - Google Patents

Method of making silicon single crystal bar doped with phosphorus

Info

Publication number
JPS5261955A
JPS5261955A JP51137197A JP13719776A JPS5261955A JP S5261955 A JPS5261955 A JP S5261955A JP 51137197 A JP51137197 A JP 51137197A JP 13719776 A JP13719776 A JP 13719776A JP S5261955 A JPS5261955 A JP S5261955A
Authority
JP
Japan
Prior art keywords
phosphorus
single crystal
silicon single
crystal bar
making silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51137197A
Other languages
English (en)
Other versions
JPS6046072B2 (ja
Inventor
Keraa Uorufugangu
Kuramaa Heruberuto
Roishieru Konraato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25769618&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPS5261955(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from DE19752551281 external-priority patent/DE2551281A1/de
Priority claimed from DE19752551301 external-priority patent/DE2551301C3/de
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5261955A publication Critical patent/JPS5261955A/ja
Publication of JPS6046072B2 publication Critical patent/JPS6046072B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/06—Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Recrystallisation Techniques (AREA)
JP51137197A 1975-11-14 1976-11-15 リンをドープされたシリコン単結晶棒の製造方法 Expired JPS6046072B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE19752551281 DE2551281A1 (de) 1975-11-14 1975-11-14 Verfahren zum herstellen von phosphordotierten siliciumeinkristallen mit in radialer richtung gezielter randlicher anreicherung des dotierstoffes
DE2551281.6 1975-11-14
DE19752551301 DE2551301C3 (de) 1975-11-14 1975-11-14 Verfahren zum Herstellen von phosphordotierten Siliciumeinkristallen mit in radialer Richtung gezielter randlicher Ahreicherung des Dotierstoffes
DE2551301.3 1975-11-14

Publications (2)

Publication Number Publication Date
JPS5261955A true JPS5261955A (en) 1977-05-21
JPS6046072B2 JPS6046072B2 (ja) 1985-10-14

Family

ID=25769618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51137197A Expired JPS6046072B2 (ja) 1975-11-14 1976-11-15 リンをドープされたシリコン単結晶棒の製造方法

Country Status (7)

Country Link
US (1) US4126509A (ja)
JP (1) JPS6046072B2 (ja)
CA (1) CA1085703A (ja)
DK (1) DK512476A (ja)
FR (1) FR2331378A1 (ja)
GB (1) GB1542868A (ja)
SU (1) SU793412A3 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4270972A (en) * 1980-03-31 1981-06-02 Rockwell International Corporation Method for controlled doping semiconductor material with highly volatile dopant
GB2082933B (en) * 1980-09-03 1984-10-03 Westinghouse Electric Corp High voltage semiconductor materials and structures and method for their
JPS63115766U (ja) * 1987-01-20 1988-07-26
CN100351435C (zh) * 2005-09-29 2007-11-28 天津市环欧半导体材料技术有限公司 区熔气相掺杂太阳能电池硅单晶的制备方法
CN100339513C (zh) * 2006-04-19 2007-09-26 天津市环欧半导体材料技术有限公司 区熔硅单晶炉电气控制系统
CN1325701C (zh) * 2006-04-26 2007-07-11 天津市环欧半导体材料技术有限公司 气相预掺杂和中子辐照掺杂组合的区熔硅单晶的生产方法
CN1325702C (zh) * 2006-04-26 2007-07-11 天津市环欧半导体材料技术有限公司 区熔气相掺杂太阳能电池硅单晶的生产方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2854363A (en) * 1953-04-02 1958-09-30 Int Standard Electric Corp Method of producing semiconductor crystals containing p-n junctions
DE1164680B (de) * 1958-05-21 1964-03-05 Siemens Ag Verfahren zum Herstellen von stabfoermigen Halbleiterkoerpern hoher Reinheit
US3092462A (en) * 1960-01-28 1963-06-04 Philips Corp Method for the manufacture of rods of meltable material
NL253184A (ja) * 1960-06-28
DE1303150B (ja) * 1961-01-13 1971-05-13 Philips Nv
DE1519903A1 (de) * 1966-09-24 1970-02-12 Siemens Ag Verfahren mit tiegelfreien Zonenschmelzen eines kristallinen Stabes
US3773499A (en) * 1968-04-03 1973-11-20 M Melnikov Method of zonal melting of materials
BE788026A (fr) * 1971-08-26 1973-02-26 Siemens Ag Procede et dispositif d'introduction dirigee de matieres de dopage dansdes cristaux semiconducteurs lors d'une fusion par zones sans creuset
DE2234512C3 (de) * 1972-07-13 1979-04-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von (Umorientierten Halbleitereinkristallstäben mit zur Stabmitte abtauendem spezifischem Widerstand
DE2338338C3 (de) * 1973-07-27 1979-04-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum Dotieren beim tiegelfreien Zonenschmelzen eines Halbleiterkristallstabes
FR2257998B1 (ja) * 1974-01-10 1976-11-26 Commissariat Energie Atomique

Also Published As

Publication number Publication date
US4126509A (en) 1978-11-21
CA1085703A (en) 1980-09-16
FR2331378B3 (ja) 1979-07-20
DK512476A (da) 1977-05-15
JPS6046072B2 (ja) 1985-10-14
SU793412A3 (ru) 1980-12-30
GB1542868A (en) 1979-03-28
FR2331378A1 (fr) 1977-06-10

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