FR2331378A1 - Procede pour fabriquer des monocristaux de silicium dopes au phosphore avec un appauvrissement ou un enrichissement marginal en substance dopante, desire suivant une direction radiale. - Google Patents

Procede pour fabriquer des monocristaux de silicium dopes au phosphore avec un appauvrissement ou un enrichissement marginal en substance dopante, desire suivant une direction radiale.

Info

Publication number
FR2331378A1
FR2331378A1 FR7633738A FR7633738A FR2331378A1 FR 2331378 A1 FR2331378 A1 FR 2331378A1 FR 7633738 A FR7633738 A FR 7633738A FR 7633738 A FR7633738 A FR 7633738A FR 2331378 A1 FR2331378 A1 FR 2331378A1
Authority
FR
France
Prior art keywords
enrichment
depletion
marginal
phosphorus
radial direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7633738A
Other languages
English (en)
Other versions
FR2331378B3 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25769618&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FR2331378(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from DE19752551301 external-priority patent/DE2551301C3/de
Priority claimed from DE19752551281 external-priority patent/DE2551281A1/de
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2331378A1 publication Critical patent/FR2331378A1/fr
Application granted granted Critical
Publication of FR2331378B3 publication Critical patent/FR2331378B3/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/06Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Recrystallisation Techniques (AREA)
FR7633738A 1975-11-14 1976-11-09 Procede pour fabriquer des monocristaux de silicium dopes au phosphore avec un appauvrissement ou un enrichissement marginal en substance dopante, desire suivant une direction radiale. Granted FR2331378A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19752551301 DE2551301C3 (de) 1975-11-14 1975-11-14 Verfahren zum Herstellen von phosphordotierten Siliciumeinkristallen mit in radialer Richtung gezielter randlicher Ahreicherung des Dotierstoffes
DE19752551281 DE2551281A1 (de) 1975-11-14 1975-11-14 Verfahren zum herstellen von phosphordotierten siliciumeinkristallen mit in radialer richtung gezielter randlicher anreicherung des dotierstoffes

Publications (2)

Publication Number Publication Date
FR2331378A1 true FR2331378A1 (fr) 1977-06-10
FR2331378B3 FR2331378B3 (fr) 1979-07-20

Family

ID=25769618

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7633738A Granted FR2331378A1 (fr) 1975-11-14 1976-11-09 Procede pour fabriquer des monocristaux de silicium dopes au phosphore avec un appauvrissement ou un enrichissement marginal en substance dopante, desire suivant une direction radiale.

Country Status (7)

Country Link
US (1) US4126509A (fr)
JP (1) JPS6046072B2 (fr)
CA (1) CA1085703A (fr)
DK (1) DK512476A (fr)
FR (1) FR2331378A1 (fr)
GB (1) GB1542868A (fr)
SU (1) SU793412A3 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2489374A1 (fr) * 1980-09-03 1982-03-05 Westinghouse Electric Corp Structures et materiaux semi-conducteurs haute tension et procede pour les preparer

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4270972A (en) * 1980-03-31 1981-06-02 Rockwell International Corporation Method for controlled doping semiconductor material with highly volatile dopant
JPS63115766U (fr) * 1987-01-20 1988-07-26
CN100351435C (zh) * 2005-09-29 2007-11-28 天津市环欧半导体材料技术有限公司 区熔气相掺杂太阳能电池硅单晶的制备方法
CN100339513C (zh) * 2006-04-19 2007-09-26 天津市环欧半导体材料技术有限公司 区熔硅单晶炉电气控制系统
CN1325701C (zh) * 2006-04-26 2007-07-11 天津市环欧半导体材料技术有限公司 气相预掺杂和中子辐照掺杂组合的区熔硅单晶的生产方法
CN1325702C (zh) * 2006-04-26 2007-07-11 天津市环欧半导体材料技术有限公司 区熔气相掺杂太阳能电池硅单晶的生产方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2854363A (en) * 1953-04-02 1958-09-30 Int Standard Electric Corp Method of producing semiconductor crystals containing p-n junctions
DE1164680B (de) * 1958-05-21 1964-03-05 Siemens Ag Verfahren zum Herstellen von stabfoermigen Halbleiterkoerpern hoher Reinheit
US3092462A (en) * 1960-01-28 1963-06-04 Philips Corp Method for the manufacture of rods of meltable material
NL104013C (fr) * 1960-06-28
NL260045A (fr) * 1961-01-13
DE1519903A1 (de) * 1966-09-24 1970-02-12 Siemens Ag Verfahren mit tiegelfreien Zonenschmelzen eines kristallinen Stabes
US3773499A (en) * 1968-04-03 1973-11-20 M Melnikov Method of zonal melting of materials
BE788026A (fr) * 1971-08-26 1973-02-26 Siemens Ag Procede et dispositif d'introduction dirigee de matieres de dopage dansdes cristaux semiconducteurs lors d'une fusion par zones sans creuset
DE2234512C3 (de) * 1972-07-13 1979-04-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von (Umorientierten Halbleitereinkristallstäben mit zur Stabmitte abtauendem spezifischem Widerstand
DE2338338C3 (de) * 1973-07-27 1979-04-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum Dotieren beim tiegelfreien Zonenschmelzen eines Halbleiterkristallstabes
FR2257998B1 (fr) * 1974-01-10 1976-11-26 Commissariat Energie Atomique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2489374A1 (fr) * 1980-09-03 1982-03-05 Westinghouse Electric Corp Structures et materiaux semi-conducteurs haute tension et procede pour les preparer

Also Published As

Publication number Publication date
JPS5261955A (en) 1977-05-21
DK512476A (da) 1977-05-15
JPS6046072B2 (ja) 1985-10-14
SU793412A3 (ru) 1980-12-30
US4126509A (en) 1978-11-21
GB1542868A (en) 1979-03-28
CA1085703A (fr) 1980-09-16
FR2331378B3 (fr) 1979-07-20

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