JPS5249774A - Ion implanting device - Google Patents

Ion implanting device

Info

Publication number
JPS5249774A
JPS5249774A JP50125320A JP12532075A JPS5249774A JP S5249774 A JPS5249774 A JP S5249774A JP 50125320 A JP50125320 A JP 50125320A JP 12532075 A JP12532075 A JP 12532075A JP S5249774 A JPS5249774 A JP S5249774A
Authority
JP
Japan
Prior art keywords
ion implanting
implanting device
slit
electromagnet
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50125320A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6412061B2 (enrdf_load_stackoverflow
Inventor
Katsumi Tokikuchi
Kuniyuki Sakumichi
Toshimichi Taya
Hideki Koike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50125320A priority Critical patent/JPS5249774A/ja
Publication of JPS5249774A publication Critical patent/JPS5249774A/ja
Publication of JPS6412061B2 publication Critical patent/JPS6412061B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Welding Or Cutting Using Electron Beams (AREA)
  • Physical Vapour Deposition (AREA)
JP50125320A 1975-10-20 1975-10-20 Ion implanting device Granted JPS5249774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50125320A JPS5249774A (en) 1975-10-20 1975-10-20 Ion implanting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50125320A JPS5249774A (en) 1975-10-20 1975-10-20 Ion implanting device

Publications (2)

Publication Number Publication Date
JPS5249774A true JPS5249774A (en) 1977-04-21
JPS6412061B2 JPS6412061B2 (enrdf_load_stackoverflow) 1989-02-28

Family

ID=14907180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50125320A Granted JPS5249774A (en) 1975-10-20 1975-10-20 Ion implanting device

Country Status (1)

Country Link
JP (1) JPS5249774A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56156662A (en) * 1980-05-02 1981-12-03 Hitachi Ltd Device for ion implantation
JPS5966045A (ja) * 1982-10-08 1984-04-14 Hitachi Ltd 表面改質装置
JPS61124568A (ja) * 1984-11-16 1986-06-12 Matsushita Electric Ind Co Ltd イオンビ−ムスパツタ装置
JPS61202705A (ja) * 1985-03-07 1986-09-08 Kawasaki Steel Corp 熱間スラブの連続幅圧下プレス装置
JPS62146519U (enrdf_load_stackoverflow) * 1986-03-06 1987-09-16
JPH0163061U (enrdf_load_stackoverflow) * 1987-10-15 1989-04-24
JP2006156184A (ja) * 2004-11-30 2006-06-15 Sumitomo Eaton Noba Kk イオンビーム／荷電粒子ビーム照射装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02305790A (ja) * 1989-05-22 1990-12-19 Toshiba Corp 低層階建物用エレベータ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5164373A (enrdf_load_stackoverflow) * 1974-07-31 1976-06-03 Atomic Energy Authority Uk

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5164373A (enrdf_load_stackoverflow) * 1974-07-31 1976-06-03 Atomic Energy Authority Uk

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56156662A (en) * 1980-05-02 1981-12-03 Hitachi Ltd Device for ion implantation
JPS5966045A (ja) * 1982-10-08 1984-04-14 Hitachi Ltd 表面改質装置
JPS61124568A (ja) * 1984-11-16 1986-06-12 Matsushita Electric Ind Co Ltd イオンビ−ムスパツタ装置
JPS61202705A (ja) * 1985-03-07 1986-09-08 Kawasaki Steel Corp 熱間スラブの連続幅圧下プレス装置
JPS62146519U (enrdf_load_stackoverflow) * 1986-03-06 1987-09-16
JPH0163061U (enrdf_load_stackoverflow) * 1987-10-15 1989-04-24
JP2006156184A (ja) * 2004-11-30 2006-06-15 Sumitomo Eaton Noba Kk イオンビーム／荷電粒子ビーム照射装置

Also Published As

Publication number Publication date
JPS6412061B2 (enrdf_load_stackoverflow) 1989-02-28

Similar Documents

Publication Publication Date Title
DE2862132D1 (en) Device for implanting strong-current ions, comprising electrostatic deflection plates and magnetic refocussing means
JPS5249774A (en) Ion implanting device
JPS5439191A (en) Oxygen detector
JPS56156662A (en) Device for ion implantation
JPS51119287A (en) Recutangular-shape beam ion source
JPS52123174A (en) Specimen scanning method for ion implantation
JPS5633820A (en) Device for ion implantation
JPS52150688A (en) Solid ion source
JPS5217886A (en) Multikind ion detector
JPS5292473A (en) Main lens electric field forming method of inline type 3 beam electron gun
JPS5341982A (en) Wafer holder for ion implantation processing
JPS51117569A (en) Sample drift correction device
JPS5313869A (en) Cathode ray tube
JPS5248471A (en) Ion implantation device
JPS5358769A (en) Ion injector
JPS5632722A (en) Ion implanting apparatus
JPS53134200A (en) Radioactive gaseous ion implantation system
JPS5226153A (en) Sample electrification protection device in electron microscopes
JPS643951A (en) Ion implantation method and device
JPS531398A (en) Ion implanting chamber
JPS523490A (en) Monitor of radiation energy
JPS5611843A (en) Ion implanter
JPS53115172A (en) Ion implanting method
JPS53142162A (en) Hot cathode
JPS5216176A (en) Ion driving device

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 19820406