JPS53134200A - Radioactive gaseous ion implantation system - Google Patents
Radioactive gaseous ion implantation systemInfo
- Publication number
- JPS53134200A JPS53134200A JP4779477A JP4779477A JPS53134200A JP S53134200 A JPS53134200 A JP S53134200A JP 4779477 A JP4779477 A JP 4779477A JP 4779477 A JP4779477 A JP 4779477A JP S53134200 A JPS53134200 A JP S53134200A
- Authority
- JP
- Japan
- Prior art keywords
- ion implantation
- implantation system
- gaseous ion
- radioactive gaseous
- radioactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: In the process of accelerating radioactive gaseous ions to high velocity and implanting them into a substrate, to detect the saturation of implantation by measuring the quantity of X-rays emitted from the surface of the substrate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4779477A JPS53134200A (en) | 1977-04-27 | 1977-04-27 | Radioactive gaseous ion implantation system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4779477A JPS53134200A (en) | 1977-04-27 | 1977-04-27 | Radioactive gaseous ion implantation system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53134200A true JPS53134200A (en) | 1978-11-22 |
Family
ID=12785269
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4779477A Pending JPS53134200A (en) | 1977-04-27 | 1977-04-27 | Radioactive gaseous ion implantation system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53134200A (en) |
-
1977
- 1977-04-27 JP JP4779477A patent/JPS53134200A/en active Pending
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