JPS53134200A - Radioactive gaseous ion implantation system - Google Patents

Radioactive gaseous ion implantation system

Info

Publication number
JPS53134200A
JPS53134200A JP4779477A JP4779477A JPS53134200A JP S53134200 A JPS53134200 A JP S53134200A JP 4779477 A JP4779477 A JP 4779477A JP 4779477 A JP4779477 A JP 4779477A JP S53134200 A JPS53134200 A JP S53134200A
Authority
JP
Japan
Prior art keywords
ion implantation
implantation system
gaseous ion
radioactive gaseous
radioactive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4779477A
Other languages
Japanese (ja)
Inventor
Masashi Iimura
Satoru Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4779477A priority Critical patent/JPS53134200A/en
Publication of JPS53134200A publication Critical patent/JPS53134200A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: In the process of accelerating radioactive gaseous ions to high velocity and implanting them into a substrate, to detect the saturation of implantation by measuring the quantity of X-rays emitted from the surface of the substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP4779477A 1977-04-27 1977-04-27 Radioactive gaseous ion implantation system Pending JPS53134200A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4779477A JPS53134200A (en) 1977-04-27 1977-04-27 Radioactive gaseous ion implantation system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4779477A JPS53134200A (en) 1977-04-27 1977-04-27 Radioactive gaseous ion implantation system

Publications (1)

Publication Number Publication Date
JPS53134200A true JPS53134200A (en) 1978-11-22

Family

ID=12785269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4779477A Pending JPS53134200A (en) 1977-04-27 1977-04-27 Radioactive gaseous ion implantation system

Country Status (1)

Country Link
JP (1) JPS53134200A (en)

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