JPS5245271A - Process for washing surface of semiconductor element - Google Patents

Process for washing surface of semiconductor element

Info

Publication number
JPS5245271A
JPS5245271A JP12069675A JP12069675A JPS5245271A JP S5245271 A JPS5245271 A JP S5245271A JP 12069675 A JP12069675 A JP 12069675A JP 12069675 A JP12069675 A JP 12069675A JP S5245271 A JPS5245271 A JP S5245271A
Authority
JP
Japan
Prior art keywords
semiconductor element
washing surface
washing
forming solder
solder electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12069675A
Other languages
Japanese (ja)
Inventor
Toru Kawanobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12069675A priority Critical patent/JPS5245271A/en
Publication of JPS5245271A publication Critical patent/JPS5245271A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To be able to wash surface of elements easily after forming solder electrode.
COPYRIGHT: (C)1977,JPO&Japio
JP12069675A 1975-10-08 1975-10-08 Process for washing surface of semiconductor element Pending JPS5245271A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12069675A JPS5245271A (en) 1975-10-08 1975-10-08 Process for washing surface of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12069675A JPS5245271A (en) 1975-10-08 1975-10-08 Process for washing surface of semiconductor element

Publications (1)

Publication Number Publication Date
JPS5245271A true JPS5245271A (en) 1977-04-09

Family

ID=14792701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12069675A Pending JPS5245271A (en) 1975-10-08 1975-10-08 Process for washing surface of semiconductor element

Country Status (1)

Country Link
JP (1) JPS5245271A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03219000A (en) * 1989-11-09 1991-09-26 Nippon Steel Corp Etching method and washing method for silicon wafer
JP2002359248A (en) * 2001-06-01 2002-12-13 Fuji Electric Co Ltd Method for manufacturing mesa-type semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03219000A (en) * 1989-11-09 1991-09-26 Nippon Steel Corp Etching method and washing method for silicon wafer
JP2002359248A (en) * 2001-06-01 2002-12-13 Fuji Electric Co Ltd Method for manufacturing mesa-type semiconductor device

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